We present measurements of ballistic magnetoresistance in nanocontacts grown by electrodeposition of Ni microclusters on magnetic thin films covered by aluminum oxide layers, using a technique proposed by Schad et al. [D. Allen, R. Schad, G. Zangari, I. Zana, D. Yang, M. C. Tondra, and D. Wang, J. Vac. Sci. Technol. A. 18, 1830 (2000); Appl. Phys. Lett. 76, 407 (2000); D. Allen, R. Schad, G. Zangari, I. Zana, D. Yang, M. C. Tondra, D. Wang, and D. Reed, J. Appl. Phys. 89, 6662 (2001)]. The measurements are made on single Ni clusters in contact with a Ni and Co thin film. We measure the magnetoresistance and observe the relaxation of the magnetization and electrical resistance as a function of time. The clusters are electrodeposited under several different experimental conditions. Some are deposited randomly on an unpatterned film and some through various patterned photoresists that control the location at which the cluster is grown. The typical contact size is estimated from the electrical resistance to be 10–30 nm. Ballistic magnetoresistance values up to 14% are obtained in these first experiments.
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29 October 2001
Research Article|
October 29 2001
Ballistic magnetoresistance in a nanocontact between a Ni cluster and a magnetic thin film
M. Muñoz;
M. Muñoz
Laboratorio de Fı́sica de Sistemas Pequeños y Nanotecnologı́a, Consejo Superior de Investigaciones Cientı́ficas (CSIC), Serrano 144 E-28006 Madrid, Spain
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G. G. Qian;
G. G. Qian
Laboratorio de Fı́sica de Sistemas Pequeños y Nanotecnologı́a, Consejo Superior de Investigaciones Cientı́ficas (CSIC), Serrano 144 E-28006 Madrid, Spain
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N. Karar;
N. Karar
Laboratorio de Fı́sica de Sistemas Pequeños y Nanotecnologı́a, Consejo Superior de Investigaciones Cientı́ficas (CSIC), Serrano 144 E-28006 Madrid, Spain
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H. Cheng;
H. Cheng
Laboratorio de Fı́sica de Sistemas Pequeños y Nanotecnologı́a, Consejo Superior de Investigaciones Cientı́ficas (CSIC), Serrano 144 E-28006 Madrid, Spain
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I. G. Saveliev;
I. G. Saveliev
Laboratorio de Fı́sica de Sistemas Pequeños y Nanotecnologı́a, Consejo Superior de Investigaciones Cientı́ficas (CSIC), Serrano 144 E-28006 Madrid, Spain
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N. Garcı́a;
N. Garcı́a
Laboratorio de Fı́sica de Sistemas Pequeños y Nanotecnologı́a, Consejo Superior de Investigaciones Cientı́ficas (CSIC), Serrano 144 E-28006 Madrid, Spain
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T. P. Moffat;
T. P. Moffat
National Institute of Standards and Technology, Gaithersburg, Maryland 20988
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P. J. Chen;
P. J. Chen
National Institute of Standards and Technology, Gaithersburg, Maryland 20988
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L. Gan;
L. Gan
National Institute of Standards and Technology, Gaithersburg, Maryland 20988
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W. F. Egelhoff, Jr.
W. F. Egelhoff, Jr.
National Institute of Standards and Technology, Gaithersburg, Maryland 20988
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Appl. Phys. Lett. 79, 2946–2948 (2001)
Article history
Received:
May 24 2001
Accepted:
August 17 2001
Citation
M. Muñoz, G. G. Qian, N. Karar, H. Cheng, I. G. Saveliev, N. Garcı́a, T. P. Moffat, P. J. Chen, L. Gan, W. F. Egelhoff; Ballistic magnetoresistance in a nanocontact between a Ni cluster and a magnetic thin film. Appl. Phys. Lett. 29 October 2001; 79 (18): 2946–2948. https://doi.org/10.1063/1.1413734
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