We have developed a lithography process which originates from imprint lithography and offers advantages over it. Unlike imprint lithography, not only the sample but also the mold is covered with a thermoplastic polymer. The mold and sample are brought into contact, pressed together and heated above the glass transition temperature of the thermoplast, causing the two polymer layers to become bonded (glued) together. A special treatment of the mold and sample surface causes the polymer film to stick only to the substrate after cooling. The bonding occurs at pressures and temperatures lower than those usually applied in imprint technology, and eliminates problems in conventional imprint technology that are related to lateral transport of the polymer.
Skip Nav Destination
Article navigation
1 October 2001
Research Article|
October 01 2001
Polymer bonding process for nanolithography
T. Borzenko;
T. Borzenko
Physical Institute of University of Wuerzburg, Am Hubland, 97074 Wuerzburg, Germany
Search for other works by this author on:
M. Tormen;
M. Tormen
Physical Institute of University of Wuerzburg, Am Hubland, 97074 Wuerzburg, Germany
Search for other works by this author on:
G. Schmidt;
G. Schmidt
Physical Institute of University of Wuerzburg, Am Hubland, 97074 Wuerzburg, Germany
Search for other works by this author on:
L. W. Molenkamp;
L. W. Molenkamp
Physical Institute of University of Wuerzburg, Am Hubland, 97074 Wuerzburg, Germany
Search for other works by this author on:
H. Janssen
H. Janssen
Laboratory of Macromolecular and Organic Chemistry, Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands
Search for other works by this author on:
Appl. Phys. Lett. 79, 2246–2248 (2001)
Article history
Received:
April 05 2001
Accepted:
August 06 2001
Citation
T. Borzenko, M. Tormen, G. Schmidt, L. W. Molenkamp, H. Janssen; Polymer bonding process for nanolithography. Appl. Phys. Lett. 1 October 2001; 79 (14): 2246–2248. https://doi.org/10.1063/1.1406561
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
Roadmap on photonic metasurfaces
Sebastian A. Schulz, Rupert. F. Oulton, et al.
Era of entropy: Synthesis, structure, properties, and applications of high-entropy materials
Christina M. Rost, Alessandro R. Mazza, et al.
Piezoelectric phononic integrated circuits
Krishna C. Balram
Related Content
On the role of surface tensions and process conditions in detachment nanolithography
Appl. Phys. Lett. (June 2008)
Scanning probe with an integrated diamond heater element for nanolithography
Appl. Phys. Lett. (February 2003)
Highly tunable, high-throughput nanolithography based on strained regioregular conducting polymer films
Appl. Phys. Lett. (July 2006)
Micro∕nanoscopic patterning of polymeric materials by atomic force microscope assisted electrohydrodynamic nanolithography
J. Appl. Phys. (January 2008)
Integrated microfluidic linking chip for scanning probe nanolithography
Appl. Phys. Lett. (July 2004)