Considerable interest exists in fabrication of electronic devices from thin film polycrystalline diamond. To date, doping this material to achieve good free carrier concentrations and mobilities at room temperature has proved difficult. In this letter we report low temperature Hall effect measurements made on diamond films subjected to a hydrogenation process, such that the near surface region becomes p type without the addition of conventional dopant atoms. High carrier concentrations and mobilities can be achieved. The change in carrier concentration within the temperature range 10–300 K does not change as expected for most films, actually increasing as the temperature falls. This effect could be related to the confinement of carriers at the surface caused by the dipole provoked by adsorbed hydrogen on the diamond. However, polished films display more conventional behavior in that the carrier concentration falls with falling temperature.
Skip Nav Destination
Article navigation
28 May 2001
Research Article|
May 28 2001
Formation of shallow acceptor states in the surface region of thin film diamond
Oliver A. Williams;
Oliver A. Williams
Electronic and Electrical Engineering, University College London, Torrington Place, London, WC1E 7JE United Kingdom
Search for other works by this author on:
Michael D. Whitfield;
Michael D. Whitfield
Electronic and Electrical Engineering, University College London, Torrington Place, London, WC1E 7JE United Kingdom
Search for other works by this author on:
Richard B. Jackman;
Richard B. Jackman
Electronic and Electrical Engineering, University College London, Torrington Place, London, WC1E 7JE United Kingdom
Search for other works by this author on:
John S. Foord;
John S. Foord
Physical and Theoretical Chemistry, University of Oxford, South Parks Road, Oxford, OX1 3QZ United Kingdom
Search for other works by this author on:
James E. Butler;
James E. Butler
Code 6174, Naval Research Laboratory, Washington, DC 20375
Search for other works by this author on:
Christoph E. Nebel
Christoph E. Nebel
Walter Schottky Institut, TU-Muenchen, AM Coulombwall, D-80469 Muenchen, Germany
Search for other works by this author on:
Appl. Phys. Lett. 78, 3460–3462 (2001)
Article history
Received:
July 26 2000
Accepted:
November 29 2000
Citation
Oliver A. Williams, Michael D. Whitfield, Richard B. Jackman, John S. Foord, James E. Butler, Christoph E. Nebel; Formation of shallow acceptor states in the surface region of thin film diamond. Appl. Phys. Lett. 28 May 2001; 78 (22): 3460–3462. https://doi.org/10.1063/1.1345806
Download citation file:
Sign in
Don't already have an account? Register
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Pay-Per-View Access
$40.00
Citing articles via
Special topic on Wide- and ultrawide-bandgap electronic semiconductor devices
Joachim Würfl, Tomás Palacios, et al.
Roadmap on photonic metasurfaces
Sebastian A. Schulz, Rupert. F. Oulton, et al.
Feedback cooling of an insulating high-Q diamagnetically levitated plate
S. Tian, K. Jadeja, et al.