The effect of a thin interlayer of Pt on the stability of NiSi films on Si(111) substrates has been investigated. Both x-ray diffraction (XRD) data and sheet resistance measurements show a remarkable improvement in the thermal stability of NiSi due to the Pt interlayer. Detailed study on the XRD data shows PtSi and NiSi form a solid solution following a Vegard’s law. It was found in Ni/Pt/Si samples that a transition in NiSi texture from (200)NiSi‖(111)Si to (002)NiSi‖(111)Si took place before the nucleation of NiSi2, which may contribute to the enhanced stability of NiSi films.

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