Differential postgrowth hydrogen passivation of deep levels in grown by metal-organic chemical vapor deposition has been directly observed by means of both deep level transient spectroscopy and deep level optical spectroscopy. Two deep levels found at and 1.35 eV show strong H passivation effects, with their concentrations decreasing by a factor of ⩾30 and ∼14, respectively. The decrease in the 0.62 eV trap concentration together with its correlation with the presence of Mg in is consistent with Mg–H complex formation. A band of closely spaced deep levels observed at narrows to after hydrogenation, consistent with hydrogen complexing with defects as anticipated by earlier theoretical results. Finally, a deep level at likely related to background acceptors remains unaffected by hydrogen.
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4 September 2000
Research Article|
September 04 2000
Hydrogen passivation of deep levels in Available to Purchase
A. Hierro;
A. Hierro
Department of Electrical Engineering, The Ohio State University, Columbus, Ohio 43210
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S. A. Ringel;
S. A. Ringel
Department of Electrical Engineering, The Ohio State University, Columbus, Ohio 43210
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M. Hansen;
M. Hansen
Materials and Electrical and Computer Engineering Departments, University of California, Santa Barbara, California 93016
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J. S. Speck;
J. S. Speck
Materials and Electrical and Computer Engineering Departments, University of California, Santa Barbara, California 93016
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U. K. Mishra;
U. K. Mishra
Materials and Electrical and Computer Engineering Departments, University of California, Santa Barbara, California 93016
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S. P. DenBaars
S. P. DenBaars
Materials and Electrical and Computer Engineering Departments, University of California, Santa Barbara, California 93016
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A. Hierro
Department of Electrical Engineering, The Ohio State University, Columbus, Ohio 43210
S. A. Ringel
Department of Electrical Engineering, The Ohio State University, Columbus, Ohio 43210
M. Hansen
Materials and Electrical and Computer Engineering Departments, University of California, Santa Barbara, California 93016
J. S. Speck
Materials and Electrical and Computer Engineering Departments, University of California, Santa Barbara, California 93016
U. K. Mishra
Materials and Electrical and Computer Engineering Departments, University of California, Santa Barbara, California 93016
S. P. DenBaars
Materials and Electrical and Computer Engineering Departments, University of California, Santa Barbara, California 93016
Appl. Phys. Lett. 77, 1499–1501 (2000)
Article history
Received:
May 15 2000
Accepted:
July 05 2000
Citation
A. Hierro, S. A. Ringel, M. Hansen, J. S. Speck, U. K. Mishra, S. P. DenBaars; Hydrogen passivation of deep levels in . Appl. Phys. Lett. 4 September 2000; 77 (10): 1499–1501. https://doi.org/10.1063/1.1290042
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