A patterned CoSi2/Si substrate was used for the catalytic growth of carbon nanostructures and nanotubes in the temperature range of 750–800 °C, using acetylene/N2 as a reaction mixture flowing through a quartz tube at ambient pressure. Selective nucleation confined to the CoSi2/Si interface region was achieved. Scanning electron microscopy and transmission electron microscopy were used to investigate the grown nanostructures.

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