The interdiffusion reaction between supersaturated nanocrystalline Zr100−xAlx and crystalline Ni films leads to the formation of a planar amorphous Zr–Al–Ni interlayer. This solid-state amorphization reaction has been investigated by in situ measurement of electrical conductance and by transmission electron microscopy. With increasing defect density in the Zr100−xAlx layers, the diffusivity of Ni in the amorphous interlayer increases and the activation energy decreases. These results are discussed with respect to Stephenson’s analysis of interdiffusion and stress formation in systems with components of differing mobilities.

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