The patterning process of heterostructure waveguides was examined for fabricating micro-optics, including channels and lenses. After the patterning of the amorphous thin films derived from spin-cast methoxyethoxide precursors by a wet etching, the patterned amorphous film was crystallized by solid-phase epitaxy. A 5-μm-wide ridge-type channel waveguide was fabricated in a heterostructure on a (100) substrate by the process. The optical confinement was successfully observed. A mode index lens was also fabricated in the heterostructure on the (100) substrate. A deflection of the collimated light by the lens was observed.
REFERENCES
1.
R. C. Alferness, in Guided-Wave Optoelectronics, edited by T. Tamir, 2nd ed. (Springer, Berlin, 1990), pp. 145–210.
2.
3.
4.
K.
Nashimoto
, S.
Nakamura
, and H.
Moriyama
, Jpn. J. Appl. Phys., Part 1
34
, 5091
(1995
).5.
K.
Nashimoto
, S.
Nakamura
, H.
Moriyama
, M.
Watanabe
, and E.
Osakabe
, Appl. Phys. Lett.
73
, 303
(1998
).6.
K.
Nashimoto
, S.
Nakamura
, T.
Morikawa
, H.
Moriyama
, M.
Watanabe
, and E.
Osakabe
, Appl. Phys. Lett.
74
, 2761
(1999
).7.
P. F.
Baude
, C.
Ye
, and D. L.
Polla
, Mater. Res. Soc. Symp. Proc.
310
, 139
(1993
).8.
K.
Nashimoto
and S.
Nakamura
, Jpn. J. Appl. Phys., Part 1
33
, 5147
(1994
).9.
H. Nishihara, M. Haruna, and T. Suhara, in Optical Integrated Circuits (McGraw-Hill, New York, 1989), pp. 266–281.
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© 1999 American Institute of Physics.
1999
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