The longitudinal magnetoresistance (LMR) of thin films of the putative half-metallic ferromagnet deposited by chemical vapor deposition onto substrates has been measured in the temperature range 0.55 K<T<4.2 K in magnetic fields up to 7 T. The dependence of the LMR on small changes in the angle between the applied field and the substrate plane was also measured at T=1.3 K. X-ray diffraction measurements showed that these films have a textured rutile structure with a axis and 〈110〉 orientations normal to the substrates. The LMR of these films at about 3 T was about twice that of similar films that showed only a 〈100〉 orientation normal to their substrates. A change in the substrate orientation relative to the applied field direction of 10° caused a 25% decrease in the magnitude of the LMR at 3 T. The results suggest that the existence of the 〈110〉 crystallite structure strongly affects the magnetoresistance.
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18 January 1999
Research Article|
January 18 1999
Longitudinal magnetoresistance of thin films
Katsuhiko Suzuki;
Katsuhiko Suzuki
Francis Bitter Magnet Laboratory, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
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P. M. Tedrow
P. M. Tedrow
Francis Bitter Magnet Laboratory, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
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Appl. Phys. Lett. 74, 428–429 (1999)
Article history
Received:
September 23 1998
Accepted:
November 09 1998
Citation
Katsuhiko Suzuki, P. M. Tedrow; Longitudinal magnetoresistance of thin films. Appl. Phys. Lett. 18 January 1999; 74 (3): 428–429. https://doi.org/10.1063/1.123050
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