Microwave-frequency (rf) power-dependence measurements performed on thin-film grain boundaries engineered on sapphire bicrystal substrates with misorientation angles of and are presented. The data are compared to measurements on films grown on single-crystal substrates. A stripline-resonator measurement technique is employed. The rf results are compared to dc measurements performed on a four-point test structure on the same substrate as the resonator. The measurements demonstrate that low-angle grain boundaries have little effect on the rf power handling, while the high-angle grain boundaries cause large nonlinear losses due to Josephson vortices created by rf currents.
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