Changes in electrical conductance of hydrogenated amorphous silicon deposited on optical waveguides in glass Available to Purchase

A study of electrical conductance of hydrogenated amorphous silicon $(a$-Si:H) films deposited on optical waveguides in a soda-lime glass (SLG) substrate is carried out, from the viewpoint of electrical instability of $a$-Si:H caused by the penetration of Na ions from the glass into the film. The optical waveguides were prepared by $K+–Na+$ or $Ag+–Na+$ ion exchange using thermal or field-assisted methods. The effective thickness of optical waveguides was of several micrometers. The obtained results show that in the case of $a$-Si:H film deposited on silver waveguide there is a dependence of electrical conductance on measurement duration, if strongly weakened as compared with film deposited on the original SLG substrate. The $a$-Si:H films deposited on potassium waveguide and on Na-extracted surface are as stable, as the referent samples with Corning 7059 (Na-free) glass substrate.