The influence of lattice misfit on the growth of Ti (0001) is investigated in the limit of small negative (−1%) and large positive (+6.8%) misfit by choosing MgO (111) and (0001) as substrate materials. Reflection high energy electron diffraction imaging and intensity measurements during growth reveal two-dimensional nucleation of islands on MgO, in contrast to three-dimensional nucleation on X-ray analysis of 30-nm-thick films on MgO shows a two-component line shape in transverse scans of the (0002) and (0004) reflections, pointing to a high degree of structural coherence in the weak disorder limit. The surface morphology of films grown on MgO depends strongly on the substrate temperature during growth.
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Research Article| October 27 1997
Titanium thin film growth on small and large misfit substrates
M. Huth, C. P. Flynn; Titanium thin film growth on small and large misfit substrates. Appl. Phys. Lett. 27 October 1997; 71 (17): 2466–2468. https://doi.org/10.1063/1.120090
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