The roughness of the interface is measured using both surface second harmonic generation (SSHG) and x-ray scattering. A comparison between these techniques shows a clear correlation for typical industrial oxides, despite the techniques being sensitive to differing regions of the roughness spectrum. The SSHG measurements are made using 10 fs pulses centered at 850 nm and at 80 MHz repetition rate. The short pulses produce a similar signal to noise ratio as earlier measurements, but use much lower average power, thus avoiding possible artifacts such as sample heating.
REFERENCES
1.
J. I.
Dadap
, B.
Doris
, Q.
Deng
, M. C.
Downer
, J. K.
Lowell
, and A. C.
Diebold
, Appl. Phys. Lett.
64
, 2139
(1994
).2.
Ultrafast Phenomena X, edited by J. Fujimoto, W. Zinth, W. H. Knox, and P. Barbara (Springer, Berlin 1996).
3.
T. F. Heinz, in Nonlinear Surface Electromagnetic Phenomena, edited by H.-E. Ponath and G. I. Stegeman (Elsivier, Amsterdam, 1991), p. 353.
4.
G.
Lüpke
, D. J.
Bottomley
, and H. M.
van Driel
, Phys. Rev. B
47
, 10389
(1993
);D. J.
Bottomley
, G.
Lüpke
, J. G.
Mihaychuk
, and H. M.
van Driel
, J. Appl. Phys.
74
, 6072
(1993
).5.
J. I.
Dadap
, X. F.
Hu
, M. H.
Anderson
, M. C.
Downer
, J. K.
Lowell
, and O. A.
Aktsipetrov
, Phys. Rev. B
53
, R7607
(1996
).6.
J. G.
Mihaychuk
, J.
Bloch
, Y.
Liu
, and H. M.
van Driel
, Opt. Lett.
20
, 2063
(1995
);J.
Bloch
, J. G.
Mihaychuk
, and H. M.
van Driel
, Phys. Rev. Lett.
77
, 920
(1996
).7.
M. T.
Asaki
, C.-P.
Huang
, D.
Garvey
, J.
Zhou
, H. C.
Kapetyn
, and M. M.
Murnane
, Opt. Lett.
18
, 977
(1993
).8.
R. L.
Fork
, O. E.
Martinez
, and J. P.
Gordon
, Opt. Lett.
9
, 150
(1984
).9.
We also tried several reflective focusing geometries that have no dispersion, but found that the signal level was not higher because a sufficiently small focus could not be achieved.
10.
J. E.
Sipe
, D. J.
Moss
, and H. M.
van Driel
, Phys. Rev. B
35
, 1129
(1987
).11.
J. L.
Dawson
, K.
Krisch
, K. W.
Evans-Lutterodt
, Mau-Tsu
Tang
, L.
Manchanda
, M. L.
Green
, D.
Brasen
, G. S.
Higashi
, and T.
Boone
, J. Appl. Phys.
77
, 4746
(1995
).12.
M.-T.
Tang
, K. W.
Evans-Lutterodt
, G. S.
Higashi
, and T.
Boone
, Appl. Phys. Lett.
62
, 3144
(1993
).13.
We also obtain larger values of / than in Ref 1. This may be due the inclusion of a “dc offset” in the fitting procedure used in Ref. 1. We did not find that including such a term measurably improved the quality of our fits.
14.
K. W. Evans-Lutterodt and M.-T. Tang, Proceedings of the 1994 Materials Research Society Conference.
15.
K. W. Evans-Lutterodt and M.-T. Tang, Proceedings of the 1995 Materials Research Society Conference.
16.
J. Sapjeta, Bell Labs; (private communication, 1996).
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