Three Y1Ba2Cu3O7−δ superconducting thin films with 20%, 60%, and 100% coverage of precipitates were fabricated into microbridges of 25×650 μm2 by a conventional photolithography method. These microbridges exhibit a Tco(R=0) from 83.6 to 87.2 K and a transition width of about 1.8 K. These also have (dR/dt)max values of about 71–78 Ω/K. We find that the fewer the precipitates on the film, the better the thermal conduction, and a larger responsivity (S) can be achieved. The best responsivity of 783 V/W measured at Ib=8 mA, Top=86.8 K, and f=2 Hz for various wavelengths of light sources is obtained from the film with 20% precipitation. The photoresponse signals decay exponentially with the precipitation coverages, which indicates that these precipitates behave as thermal resistance layers that smooth out the ac incident signal, suppress the rise in microbridge temperature, and result in a smaller photoresponse signal for the bolometer.
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26 August 1996
Research Article|
August 26 1996
Surface morphology effect on the photoresponse of high temperature superconducting microbridges Available to Purchase
Hsiung Chou;
Hsiung Chou
Department of Physics, National Sun Yat‐Sen University, Kaohsiung, Taiwan, Republic of China
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H. Z. Chen;
H. Z. Chen
Institute Electrical Engineering, National Sun Yat‐Sen University, Kaohsiung, Taiwan, Republic of China
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Y. C. Chen;
Y. C. Chen
Institute Electrical Engineering, National Sun Yat‐Sen University, Kaohsiung, Taiwan, Republic of China
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T. L. Lin;
T. L. Lin
Materials Science Center, National Tsing‐Hua University, Hsinchu, Taiwan, Republic of China
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T. C. Chow;
T. C. Chow
Department of Physics, National Sun Yat‐Sen University, Kaohsiung, Taiwan, Republic of China
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T. P. Wang
T. P. Wang
Department of Physics, National Sun Yat‐Sen University, Kaohsiung, Taiwan, Republic of China
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Hsiung Chou
Department of Physics, National Sun Yat‐Sen University, Kaohsiung, Taiwan, Republic of China
H. Z. Chen
Institute Electrical Engineering, National Sun Yat‐Sen University, Kaohsiung, Taiwan, Republic of China
Y. C. Chen
Institute Electrical Engineering, National Sun Yat‐Sen University, Kaohsiung, Taiwan, Republic of China
T. L. Lin
Materials Science Center, National Tsing‐Hua University, Hsinchu, Taiwan, Republic of China
T. C. Chow
Department of Physics, National Sun Yat‐Sen University, Kaohsiung, Taiwan, Republic of China
T. P. Wang
Department of Physics, National Sun Yat‐Sen University, Kaohsiung, Taiwan, Republic of China
Appl. Phys. Lett. 69, 1306–1308 (1996)
Article history
Received:
December 11 1995
Accepted:
July 01 1996
Citation
Hsiung Chou, H. Z. Chen, Y. C. Chen, T. L. Lin, T. C. Chow, T. P. Wang; Surface morphology effect on the photoresponse of high temperature superconducting microbridges. Appl. Phys. Lett. 26 August 1996; 69 (9): 1306–1308. https://doi.org/10.1063/1.117400
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