A laminar, flat‐flame burner has been constructed for the deposition of diamond films using an acetylene/oxygen flame at reduced pressures. The stagnation flow results in uniform deposition conditions across the diameter of the burner. Under certain operating conditions the growth rate and morphology are primarily controlled by the substrate temperature. Conditions for the deposition of <100≳ textured films are reported for a flat‐flame system. From growth rate measurements an apparent activation energy of 22 kcal/mol was observed. The maximum growth rate of 5.5 μm/h is the highest reported to date for a low pressure combustion system.

Topics
Chemical vapor deposition, Chemical elements, Activation energies, Combustion
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