A monitor for Al vapor density based on atomic absorption (AA) using a frequency‐doubled external‐cavity‐diode‐laser source at 394 nm has been demonstrated in both evaporation and sputtering processes. Closed loop operation was achieved for electron‐beam evaporated aluminum in a vacuum chamber using the AA signal for feedback. A series of runs in a dc sputtering chamber at the deposition rate of 900 Å/min illustrates the system reproducibility and the possibility of controlling the sputtering process and measuring the spatial distribution of the sputtered atoms with the AA monitor. Coherent light in the blue‐UV region (380–430 nm) using quasi‐phase‐matched lithium niobate waveguides was demonstrated with efficiencies of 25–150%/W, a range of wavelengths that covers many technologically important elements in physical vapor deposition processes.
Skip Nav Destination
Article navigation
5 February 1996
Research Article|
February 05 1996
Atomic absorption monitor for deposition process control of aluminum at 394 nm using frequency‐doubled diode laser Available to Purchase
Weizhi Wang;
Weizhi Wang
Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305
Search for other works by this author on:
M. M. Fejer;
M. M. Fejer
Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305
Search for other works by this author on:
R. H. Hammond;
R. H. Hammond
Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305
Search for other works by this author on:
M. R. Beasley;
M. R. Beasley
Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305
Search for other works by this author on:
C. H. Ahn;
C. H. Ahn
Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305
Search for other works by this author on:
M. L. Bortz;
M. L. Bortz
Focused Research, Inc., 2630 Walsh Avenue, Santa Clara, California 95051
Search for other works by this author on:
T. Day
T. Day
Focused Research, Inc., 2630 Walsh Avenue, Santa Clara, California 95051
Search for other works by this author on:
Weizhi Wang
Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305
M. M. Fejer
Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305
R. H. Hammond
Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305
M. R. Beasley
Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305
C. H. Ahn
Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305
M. L. Bortz
Focused Research, Inc., 2630 Walsh Avenue, Santa Clara, California 95051
T. Day
Focused Research, Inc., 2630 Walsh Avenue, Santa Clara, California 95051
Appl. Phys. Lett. 68, 729–731 (1996)
Article history
Received:
November 07 1995
Accepted:
November 28 1995
Citation
Weizhi Wang, M. M. Fejer, R. H. Hammond, M. R. Beasley, C. H. Ahn, M. L. Bortz, T. Day; Atomic absorption monitor for deposition process control of aluminum at 394 nm using frequency‐doubled diode laser. Appl. Phys. Lett. 5 February 1996; 68 (6): 729–731. https://doi.org/10.1063/1.116785
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
Roadmap on photonic metasurfaces
Sebastian A. Schulz, Rupert. F. Oulton, et al.
Attosecond physics and technology
O. Alexander, D. Ayuso, et al.
High breakdown voltage normally off Ga2O3 transistors on silicon substrates using GaN buffer
Mritunjay Kumar, Vishal Khandelwal, et al.
Related Content
Highly efficient quasi‐phase‐matched second‐harmonic generation using a first‐order periodically domain‐inverted LiTaO3 waveguide
Appl. Phys. Lett. (March 1992)
Diode‐laser‐based atomic absorption monitor using frequency‐modulation spectroscopy for physical vapor deposition process control
Appl. Phys. Lett. (September 1995)
Domain inversion in LiTaO3 and LiNbO3 by electric field application on chemically patterned crystals
Appl. Phys. Lett. (January 1996)
Atomic flux measurement by diode-laser-based atomic absorption spectroscopy
J. Vac. Sci. Technol. A (September 1999)
Multiple Resonance RIMS Measurements of Calcium Isotopes Using Diode Lasers
AIP Conf. Proc. (January 1997)