We present the results of large‐area (20 cm2) diamond deposition from a scaled‐up stagnation‐flow reactor. The reactor uses a unique nozzle geometry that optimizes reagent gas usage. The premixed acetylene–oxygen–hydrogen flames were operated in a highly strained configuration, allowing uniform deposition of diamond with growth rates exceeding 25 μm/h. Substrate temperature control and flame stability of the chemical vapor deposition reactor are described. Diamond films were deposited on a molybdenum substrate with a surface temperature of approximately 1200 K and C/O ratio of 1.03. Diamond film growth results are presented, and film uniformity is assessed using micro‐Raman spectroscopy.
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© 1996 American Institute of Physics.
1996
American Institute of Physics
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