Thin films of NdBa2Cu3O7−δ(NdBCO) were fabricated on SrTiO3 substrates by an off‐axis rf sputtering. Disk shaped targets of 5 cm in diameter were prepared with stoichiometric composition of NdBCO by sintering at 1273 K in air. The sintered body was single phase and exhibited Tc(R=0)=92 K. The effects of several deposition parameters on the superconducting NdBCO thin films, e.g., gas pressure, substrate temperature, oxygen annealing process, and rf power were studied. The x‐ray diffraction pattern showed the deposited thin films were highly c‐axis oriented without any impurity phase. Thin films with Tc(R=0)=87 K could be obtained reproducibly at optimized conditions. Critical current density (Jc) of the patterned thin film was 106–107 A/cm2 at low temperature.
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25 March 1996
Research Article|
March 25 1996
Properties of NdBa2Cu3O7−δ thin film prepared by off‐axis rf sputtering Available to Purchase
In‐Seon Kim;
In‐Seon Kim
Superconductivity Research Group, Korea Research Institute of Standards and Science, P.O. Box 102, Yusong, Taejon 305‐600, Republic of Korea
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Kyu Won Lee;
Kyu Won Lee
Superconductivity Research Group, Korea Research Institute of Standards and Science, P.O. Box 102, Yusong, Taejon 305‐600, Republic of Korea
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Yong Ki Park;
Yong Ki Park
Superconductivity Research Group, Korea Research Institute of Standards and Science, P.O. Box 102, Yusong, Taejon 305‐600, Republic of Korea
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Jong‐Chul Park
Jong‐Chul Park
Superconductivity Research Group, Korea Research Institute of Standards and Science, P.O. Box 102, Yusong, Taejon 305‐600, Republic of Korea
Search for other works by this author on:
In‐Seon Kim
Kyu Won Lee
Yong Ki Park
Jong‐Chul Park
Superconductivity Research Group, Korea Research Institute of Standards and Science, P.O. Box 102, Yusong, Taejon 305‐600, Republic of Korea
Appl. Phys. Lett. 68, 1859–1861 (1996)
Article history
Received:
October 30 1995
Accepted:
January 22 1996
Citation
In‐Seon Kim, Kyu Won Lee, Yong Ki Park, Jong‐Chul Park; Properties of NdBa2Cu3O7−δ thin film prepared by off‐axis rf sputtering. Appl. Phys. Lett. 25 March 1996; 68 (13): 1859–1861. https://doi.org/10.1063/1.116037
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