Thin nanocrystalline silicon (nc‐Si) films deposited by plasma enhanced chemical vapor deposition (PECVD) exhibited room‐temperature photoluminescence in the visible range of the electromagnetic spectrum. High resolution transmission electron microscopy revealed that the films are made of Si crystals with dimensions 2–15 nm. The photoluminescence spectra of the nc‐Si films were similar to the spectra observed from porous silicon produced by anodization and electrochemical dissolution of crystalline Si. This similarity suggests that the luminescence mechanism of nc‐Si films is similar to the mechanism of light emission from porous silicon. The ability to manufacture luminescent Si films by methods which are compatible with the current Si based technology, such as PECVD, can provide new possibilities in the realization of optoelectronic devices.
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4 March 1996
Research Article|
March 04 1996
Visible luminescence from nanocrystalline silicon films produced by plasma enhanced chemical vapor deposition Available to Purchase
Erik Edelberg;
Erik Edelberg
Department of Chemical Engineering, University of California Santa Barbara, Santa Barbara, California 93106
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Sam Bergh;
Sam Bergh
Department of Electrical and Computer Engineering, University of California Santa Barbara, Santa Barbara, California 93106
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Ryan Naone;
Ryan Naone
Materials Department, University of California Santa Barbara, Santa Barbara, California 93106
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Michael Hall;
Michael Hall
Department of Chemical Engineering, University of California Santa Barbara, Santa Barbara, California 93106
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Eray S. Aydil
Eray S. Aydil
Department of Chemical Engineering, University of California Santa Barbara, Santa Barbara, California 93106
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Erik Edelberg
Department of Chemical Engineering, University of California Santa Barbara, Santa Barbara, California 93106
Sam Bergh
Department of Electrical and Computer Engineering, University of California Santa Barbara, Santa Barbara, California 93106
Ryan Naone
Materials Department, University of California Santa Barbara, Santa Barbara, California 93106
Michael Hall
Department of Chemical Engineering, University of California Santa Barbara, Santa Barbara, California 93106
Eray S. Aydil
Department of Chemical Engineering, University of California Santa Barbara, Santa Barbara, California 93106
Appl. Phys. Lett. 68, 1415–1417 (1996)
Article history
Received:
December 06 1995
Accepted:
January 02 1996
Citation
Erik Edelberg, Sam Bergh, Ryan Naone, Michael Hall, Eray S. Aydil; Visible luminescence from nanocrystalline silicon films produced by plasma enhanced chemical vapor deposition. Appl. Phys. Lett. 4 March 1996; 68 (10): 1415–1417. https://doi.org/10.1063/1.116098
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