Photoluminescence spectroscopy in combination with electric‐field‐induced Raman scattering have been used to study the effect of photoexcitation on the surface electric field due to surface trap states in δ‐doped GaAs:Si/Al0.33Ga0.67As double heterostructures. Upon variation of the optical power density over four orders of magnitude a continuous reduction of the surface electric field is found for increasing cw illumination. This is evident from a decrease of the electric‐field‐induced Raman signal and from a high‐energy shift of the photoluminescence due to recombination of electrons at the δ‐doping layer with photogenerated holes localized at the topmost heterointerface. For the highest power densities of ≂103 W/cm2 the electric field at that interface becomes almost zero indicating that band bending due to surface trap states is essentially removed.  

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Please note that for the resonance conditions chosen we only probe the electric field in the near-surface side of the GaAs layer and not in the topmost A1xGa1−xAs barrier which can be seen from the absence of the A1As-like A1xGa1−xAs phonon in the Raman spectra shown in Fig. 4.
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