A scanned, focused argon ion laser beam is used to locally heat a thin polymer/palladium film applied to a polyimide‐coated substrate, thereby reducing chemically bound palladium to palladium metal. The metallic palladium is resistant to a caustic etchant that removes the unirradiated film; the residual patterned palladium then acts as a catalyst for conventional electroless plating. As an alternate patterning method a laser may be used to selectively deposit the thin polymer film on the substrate from a surrounding liquid solution.
REFERENCES
1.
J. T. Pan, S. Poon, and B. Nelson, Eighth International Electronics Packaging Conference Proceedings (International Electronics Packaging Society, Wheaton, IL, 1988), p. 174.
2.
H.
Takasago
, K.
Adachi
, and M.
Takada
, J. Electron Mater.
18
, 319
(1989
).3.
J. Haigh and M. R. Aylett, Laser Microfabrication: Thin‐Film Processes and Lithography, edited by D. J. Ehrlich and J. Y. Tsao (Academic, New York, 1989), p. 453.
4.
J. G.
Black
, S. P.
Doran
, M.
Rothschild
, J. H. C.
Sedlacek
, and D. J.
Ehrlich
, Mater. Res. Soc. Symp. Proc.
75
, 651
(1987
).5.
6.
T. H. Baum, F. A. Houle, C. R. Jones, and C. A. Kovac, U.S. Patent 4 574 095 (1986).
7.
H. S.
Cole
, Y. S.
Liu
, J. W.
Rose
, and R.
Guida
, Appl. Phys. Lett.
53
, 2111
(1988
).8.
W. J. van Ooij, Physicochemical Aspects of Polymer Surfaces, edited by K. L. Mittal (Plenum, New York, 1983), p. 1035.
9.
10.
W. M.
Grossman
and M.
Karnezos
, J. Vac. Sci. Technol. B
5
, 843
(1987
).11.
Surface Science Laboratories, Mountain View, CA 94043.
This content is only available via PDF.
© 1990 American Institute of Physics.
1990
American Institute of Physics
You do not currently have access to this content.
