Reflection high‐energy electron diffraction (RHEED) dynamic studies are used to reveal the strong differences in growth kinetics of CdTe and HgTe grown by molecular beam epitaxy. These differences arise from the stronger CdTe bond compared to the HgTe bond. Surface migration activation barriers for Cd and Hg migration on (100) Te‐stabilized surfaces were estimated from the RHEED dynamic studies to be 0.72 and 0.45 eV, respectively. These differences result in a large disparity in the ideal growth temperature for two‐dimensional layer‐by‐layer growth of the two material systems. However, by altering the growth conditions (i.e., going from anion stabilized to cation stabilized), the disparity in temperatures is shown to vanish. Consequences for this important heterostructure system are discussed.
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9 October 1989
Research Article|
October 09 1989
Use of cation‐stabilized conditions to improve compatibility of CdTe and HgTe molecular beam epitaxy Available to Purchase
José Arias;
José Arias
Rockwell International Science Center, Thousand Oaks, California 91360
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Jasprit Singh
Jasprit Singh
Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, Michigan 48109‐2122
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José Arias
Rockwell International Science Center, Thousand Oaks, California 91360
Jasprit Singh
Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, Michigan 48109‐2122
Appl. Phys. Lett. 55, 1561–1563 (1989)
Article history
Received:
April 17 1989
Accepted:
August 01 1989
Citation
José Arias, Jasprit Singh; Use of cation‐stabilized conditions to improve compatibility of CdTe and HgTe molecular beam epitaxy. Appl. Phys. Lett. 9 October 1989; 55 (15): 1561–1563. https://doi.org/10.1063/1.102244
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