The production of a new dense plasma for high rate sputtering with an electric mirror has been achieved. The plasma, with a density over 1012 cm−3 , is generated by an oscillating electron beam between two targets. Microwave excitation is detected from the dense plasma. Nonlinear interaction between the electron beam and the plasma plays an important role in increasing plasma density. The high film deposition rates over 3000 Å/min for Al have been realized.

Topics
Thin film deposition, Electron beams, Plasma production, Plasma properties and parameters
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© 1988 American Institute of Physics.
1988
American Institute of Physics
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