A theoretical comparison of In0.53Ga0.47As/InP and Al0.3Ga0.7As/GaAs heterojunction bipolar transistors has been undertaken in an effort to determine the relative merits of these material systems. The analysis uses a compact transistor model and considers devices with self‐aligned geometries including both extrinsic and intrinsic parameters. The high electron mobility in the In0.53Ga0.47As base layer and high peak velocity of electrons in the collector depletion layer result in a current gain cutoff frequency in excess of 150 GHz for an InP/In0.53Ga0.47As transistor with base thickness of 0.1 μm. Calculations revealed, however, that maximum oscillation frequency is strongly dependent on the contact resistance of the p‐type base layer, even for a self‐aligned base transistor. A maximum oscillation frequency of 138 GHz is theoretically predicted for an InP/In0.53Ga0.47As transistor with base thickness of 0.06 μm, base doping of 1×1020 cm3, a p‐type contact resistance of 1.0×107 Ω cm2, a current density of 5×104 A/cm2, and a VCB of 5 V.

1.
H.
Kroemer
,
IEEE Proc.
70
,
25
(
1982
).
2.
T. P.
Pearsall
,
IEEE J. Quantum Electron.
QE‐16
,
709
(
1980
).
3.
W.
Lee
and
C. G.
Fonstad
,
IEEE Electron Device Lett.
EDL‐7
,
683
(
1986
).
4.
R. N.
Noltenburg
,
J. C.
Bischoff
,
J. H.
Abeles
,
M. B.
Panish
, and
H.
Tempkin
,
IEDM Tech. Dig.
1986
,
278
(
1986
).
5.
R. N.
Nottenburg
,
H.
Tempkin
,
M. B.
Panish
, and
R. A.
Hamm
,
Appl. Phys. Lett.
49
,
1112
(
1986
).
6.
T. R.
Chen
,
Y. H.
Zhuang
,
B.
Chang
,
M. B.
Yi
, and
A.
Yariv
,
Appl. Phys. Lett.
50
,
874
(
1987
).
7.
W. E.
Beadle
,
K. E.
Daburlos
, and
W. H.
Eckton
, Jr.
,
IEEE Trans. Electron Devices
ED‐16
,
123
(
1969
).
8.
D. A.
Sunderland
and
P. D.
Dapkus
,
IEEE Trans. Electron Devices
ED‐34
,
367
(
1987
).
9.
E. H. C. Parker, The Technology and Physics of Molecular Beam Epitaxy (Plenum, New York, 1985), pp. 121–129.
10.
S. M. Sze, Physics of Semiconductor Devices, 2nd ed. (Wiley, New York, 1981), p. 649.
11.
M. F.
Chang
,
P. M.
Asbeck
,
K. C.
Wang
,
G. J.
Sullivan
,
N. H.
Sheng
,
J. A.
Higgins
, and
D. L.
Miller
,
IEEE Electron Device Lett.
EDL‐8
,
303
(
1987
).
12.
R.
Fischer
and
H.
Morkoç
,
IEEE Electron Device Lett.
EDL‐7
,
359
(
1986
).
13.
See, for example, E. H. C. Parker, The Technology and Physics of Molecular Beam Epitaxy (Plenum, New York, 1985), pp. 121–129. The empirical equation (4) on p. 121 and Fig. 38 on p. 129 results in the electron mobility of 490 cm2V−1s−1 for In0.53Ga0.47As and 593 cm2V−1s−1 for GaAs, respectively.
This content is only available via PDF.
You do not currently have access to this content.