Etching of Y‐Ba‐Cu‐O superconducting thin films has been accomplished using a pulsed excimer laser (248 nm, 30 ns). Etch depth as a function of the number of laser pulses was linear over a wide range of incident laser energy densities. An etch threshold energy density of 0.11 J/cm2 was observed and etch rate per pulse scaled linearly with the logarithm of the incident energy density. The dependence is adequately explained by a linear absorption model with an inverse absorption length of 2.3×105 cm−1.
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© 1987 American Institute of Physics.
1987
American Institute of Physics
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