Growth of the 889 cm⁻¹ infrared band in annealed electron‐irradiated silicon

Isothermal annealing of electron‐irradiated Czochralski silicon has been studied at four different temperatures ranging from 304 to 350 °C using infrared spectroscopy. At annealing temperatures above 300 °C the irradiation‐induced band at 830 cm⁻¹, usually attributed to a vacancy‐oxygen complex (the A center), disappears and a new band at 889 cm⁻¹ grows up. Within the experimental accuracy , the activation energy for the growth of this band is found to be identical with the value given by Stavola et al. for ‘‘anomalous’’ oxygen diffusion in silicon. Also the frequency factors for the two processes are in reasonable agreement. Our results show that a vacancy‐assisted process may provide an explanation for enhanced motion of oxygen in silicon.