Epitaxial relations in CaxSr1−xF2 (0≤x≤1) films grown on GaAs(111), (1̄1̄1̄), and Ge(111) substrates were investigated by He+ ion channeling analysis and transmission electron microscopy. Though the lattice constants of GaAs and Ge are nearly the same, the relations were found to be completely different. That is, the lattice‐matched fluoride film on GaAs exhibited an orientation identical to that of the substrate (type A orientation), whereas the orientation of the film on Ge was rotated by 180° about the surface normal 〈111〉 axis (type B orientation). It was also found that the type A growth of the Cax Sr1−x F2 films is maintained in the whole range of x on the As face of GaAs, while the growth types are partially or totally inverted in the lattice‐mismatched fluoride films grown on the Ga face of GaAs and on Ge.
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15 June 1985
Research Article|
June 15 1985
Epitaxial relations in CaxSr1−xF2 films grown on GaAs {111} and Ge(111) substrates
Kazuo Tsutsui;
Kazuo Tsutsui
Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuda, Midoriku, Yokohama 227, Japan
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Hiroshi Ishiwara;
Hiroshi Ishiwara
Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuda, Midoriku, Yokohama 227, Japan
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Tanemasa Asano;
Tanemasa Asano
Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuda, Midoriku, Yokohama 227, Japan
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Seijiro Furukawa
Seijiro Furukawa
Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuda, Midoriku, Yokohama 227, Japan
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Appl. Phys. Lett. 46, 1131–1133 (1985)
Article history
Received:
January 28 1985
Accepted:
March 26 1985
Citation
Kazuo Tsutsui, Hiroshi Ishiwara, Tanemasa Asano, Seijiro Furukawa; Epitaxial relations in CaxSr1−xF2 films grown on GaAs {111} and Ge(111) substrates. Appl. Phys. Lett. 15 June 1985; 46 (12): 1131–1133. https://doi.org/10.1063/1.95732
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