Valleytronics, utilizing the valley degree of freedom in electrons, has potential for advancing the next-generation nonvolatile storage. However, practical implementation remains challenging due to the limited control over valleytronic properties. Here, we propose ferroelectric HfCl2/Sc2CO2 van der Waals heterostructure as a platform to overcome these limitations, enabling tunable and nonvolatile valleytronic behaviors. Our findings show that the electric polarization state of the Sc2CO2 monolayer governs the electronic properties of heterostructures. Positive polarization induces a direct gap at the valleys, enabling valleytronic functionality for excitation and readout via circularly polarized light, while negative polarization results in an indirect-gap, suppressing valleytronic behavior. Moreover, our transport simulations further demonstrate a polarization-dependent ferroelectric p-i-n junction with 8 nm possesses a maximum tunnel electroresistance (TER) ratio of 1.60 × 108% at a bias of 0.5 eV. These results provide insights into ferroelectric-controlled valleytronic transitions and position the HfCl2/Sc2CO2 heterostructure as a promising candidate for energy-efficient valleytronic memory and nonvolatile storage applications.
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24 March 2025
Research Article|
March 24 2025
Ferroelectric control of valleytronic nonvolatile storage in HfCl2/Sc2CO2 heterostructure Available to Purchase
Zhou Cui
;
Zhou Cui
(Formal analysis, Investigation, Writing – original draft)
1
Multiscale Computational Materials Facility & Materials Genome Institute, School of Materials Science and Engineering, Fuzhou University
, Fuzhou 350108, China
2
Eastern Institute for Advanced Study, Eastern Institute of Technology
, Ningbo, Zhejiang 315200, China
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Xunkai Duan
;
Xunkai Duan
(Data curation, Validation)
2
Eastern Institute for Advanced Study, Eastern Institute of Technology
, Ningbo, Zhejiang 315200, China
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Jiansen Wen
;
Jiansen Wen
(Formal analysis, Writing – review & editing)
1
Multiscale Computational Materials Facility & Materials Genome Institute, School of Materials Science and Engineering, Fuzhou University
, Fuzhou 350108, China
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Ziye Zhu
;
Ziye Zhu
(Formal analysis)
2
Eastern Institute for Advanced Study, Eastern Institute of Technology
, Ningbo, Zhejiang 315200, China
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Jiayong Zhang
;
Jiayong Zhang
(Formal analysis)
2
Eastern Institute for Advanced Study, Eastern Institute of Technology
, Ningbo, Zhejiang 315200, China
3
School of Physical Science and Technology, Suzhou University of Science and Technology
, Suzhou 215009, China
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Jiajie Pei
;
Jiajie Pei
(Formal analysis)
1
Multiscale Computational Materials Facility & Materials Genome Institute, School of Materials Science and Engineering, Fuzhou University
, Fuzhou 350108, China
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Cuilian Wen
;
Cuilian Wen
a)
(Writing – review & editing)
1
Multiscale Computational Materials Facility & Materials Genome Institute, School of Materials Science and Engineering, Fuzhou University
, Fuzhou 350108, China
a)Authors to whom correspondence should be addressed: [email protected]; [email protected]; and [email protected]
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Tong Zhou
;
Tong Zhou
a)
(Writing – review & editing)
2
Eastern Institute for Advanced Study, Eastern Institute of Technology
, Ningbo, Zhejiang 315200, China
a)Authors to whom correspondence should be addressed: [email protected]; [email protected]; and [email protected]
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Bo Wu
;
Bo Wu
(Writing – review & editing)
1
Multiscale Computational Materials Facility & Materials Genome Institute, School of Materials Science and Engineering, Fuzhou University
, Fuzhou 350108, China
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Baisheng Sa
Baisheng Sa
a)
(Project administration, Supervision, Writing – review & editing)
1
Multiscale Computational Materials Facility & Materials Genome Institute, School of Materials Science and Engineering, Fuzhou University
, Fuzhou 350108, China
a)Authors to whom correspondence should be addressed: [email protected]; [email protected]; and [email protected]
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Zhou Cui
1,2
Xunkai Duan
2
Jiansen Wen
1
Ziye Zhu
2
Jiayong Zhang
2,3
Jiajie Pei
1
Cuilian Wen
1,a)
Tong Zhou
2,a)
Baisheng Sa
1,a)
1
Multiscale Computational Materials Facility & Materials Genome Institute, School of Materials Science and Engineering, Fuzhou University
, Fuzhou 350108, China
2
Eastern Institute for Advanced Study, Eastern Institute of Technology
, Ningbo, Zhejiang 315200, China
3
School of Physical Science and Technology, Suzhou University of Science and Technology
, Suzhou 215009, China
a)Authors to whom correspondence should be addressed: [email protected]; [email protected]; and [email protected]
Appl. Phys. Lett. 126, 122902 (2025)
Article history
Received:
February 11 2025
Accepted:
March 09 2025
Citation
Zhou Cui, Xunkai Duan, Jiansen Wen, Ziye Zhu, Jiayong Zhang, Jiajie Pei, Cuilian Wen, Tong Zhou, Bo Wu, Baisheng Sa; Ferroelectric control of valleytronic nonvolatile storage in HfCl2/Sc2CO2 heterostructure. Appl. Phys. Lett. 24 March 2025; 126 (12): 122902. https://doi.org/10.1063/5.0264472
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