We present the design and experimental demonstration of multilayer etched CMOS-compatible grating couplers with high efficiency on a heterogeneous silicon-lithium niobate platform. The dual-level grating coupler comprises 90 nm-thick Si waveguides and 220 nm-thick Si grating with a linear chirped structure without etching LN. The design changes the grating diffraction properties, which not only reduce back reflection but also improve directionality and fiber-to-chip mode match. In comparison with existing studies, this work achieves high coupling efficiency solely through CMOS-compatible etching without additional bottom reflectors or high-index overlays. Theoretical calculations predict a fiber-to-chip coupling efficiency of −1.76 dB and an off-chip diffraction efficiency of −1.1 dB for the TE mode. The experimental measurement of the peak coupling efficiency is −2.84 dB with the back reflection as low as −26 dB. The grating coupler paves the way for monolithic integration of Si and LN.
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19 August 2024
Research Article|
August 19 2024
High-efficiency dual-level heterogenous grating coupler on CMOS-compatible silicon-lithium niobate platform
Nina Xiong
;
Nina Xiong
(Conceptualization, Data curation, Formal analysis, Investigation, Methodology, Visualization, Writing – original draft, Writing – review & editing)
State Key Laboratory of Advanced Optical Communication Systems and Networks, Intelligent Microwave Lightwave Integration Innovation Center (imLic), Department of Electronic Engineering, Shanghai Jiao Tong University
, Shanghai 200240, China
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Jing Wang
;
Jing Wang
(Funding acquisition, Resources, Supervision, Validation, Writing – review & editing)
State Key Laboratory of Advanced Optical Communication Systems and Networks, Intelligent Microwave Lightwave Integration Innovation Center (imLic), Department of Electronic Engineering, Shanghai Jiao Tong University
, Shanghai 200240, China
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Haoru Yang
;
Haoru Yang
(Data curation, Investigation, Software, Validation)
State Key Laboratory of Advanced Optical Communication Systems and Networks, Intelligent Microwave Lightwave Integration Innovation Center (imLic), Department of Electronic Engineering, Shanghai Jiao Tong University
, Shanghai 200240, China
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Bowen Ma;
Bowen Ma
(Data curation, Formal analysis, Resources, Writing – review & editing)
State Key Laboratory of Advanced Optical Communication Systems and Networks, Intelligent Microwave Lightwave Integration Innovation Center (imLic), Department of Electronic Engineering, Shanghai Jiao Tong University
, Shanghai 200240, China
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Weiwen Zou
Weiwen Zou
a)
(Conceptualization, Formal analysis, Funding acquisition, Methodology, Resources, Software, Supervision, Validation)
State Key Laboratory of Advanced Optical Communication Systems and Networks, Intelligent Microwave Lightwave Integration Innovation Center (imLic), Department of Electronic Engineering, Shanghai Jiao Tong University
, Shanghai 200240, China
a)Author to whom correspondence should be addressed: [email protected]
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a)Author to whom correspondence should be addressed: [email protected]
Appl. Phys. Lett. 125, 083502 (2024)
Article history
Received:
June 12 2024
Accepted:
August 08 2024
Citation
Nina Xiong, Jing Wang, Haoru Yang, Bowen Ma, Weiwen Zou; High-efficiency dual-level heterogenous grating coupler on CMOS-compatible silicon-lithium niobate platform. Appl. Phys. Lett. 19 August 2024; 125 (8): 083502. https://doi.org/10.1063/5.0215468
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