Pure single crystal diamond is a superior material for electronic, quantum, and detection applications. The state-of-the-art level of background concentrations of boron and nitrogen in such diamonds is about 1 ppb, which is quite close to the detection limit of the best chemical analysis techniques. In this work, we show that the boron concentration of ∼0.1 ppb causes conductivity of ∼5 kΩ cm of the single crystal diamond if the nitrogen concentration is lower. In such a case, the temperature dependent Hall effect measurement provides ∼100 times better detection limit for the concentration of the impurities in diamond compared to the conventional optical techniques. As a result, we have found the background concentrations of boron and nitrogen at the level of 0.07 and 0.02 ppb, respectively. This fact leads to a conclusion that growth of the insulating diamond is possible only when the nitrogen concentration is higher than the boron concentration.
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22 July 2024
Research Article|
July 24 2024
Hall effect analysis of boron and nitrogen background concentration in undoped CVD diamond
Special Collection:
(Ultra)Wide-bandgap Semiconductors for Extreme Environment Electronics
D. D. Prikhodko
;
D. D. Prikhodko
a)
(Conceptualization, Formal analysis, Investigation, Project administration, Writing – original draft, Writing – review & editing)
1
Technological Institute for Superhard and Novel Carbon Materials
, Troitsk, Moscow 108840 Russia
2
Moscow Institute of Physics and Technology
, Dolgoprudny, Moscow Region 141701 Russia
a)Author to whom correspondence should be addressed: dmitrii.prikhodko@phystech.edu
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V. O. Timoshenko
;
V. O. Timoshenko
(Formal analysis, Investigation, Writing – original draft, Writing – review & editing)
1
Technological Institute for Superhard and Novel Carbon Materials
, Troitsk, Moscow 108840 Russia
2
Moscow Institute of Physics and Technology
, Dolgoprudny, Moscow Region 141701 Russia
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S. A. Tarelkin
;
S. A. Tarelkin
(Conceptualization, Project administration, Writing – review & editing)
1
Technological Institute for Superhard and Novel Carbon Materials
, Troitsk, Moscow 108840 Russia
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N. V. Kornilov
;
N. V. Kornilov
(Resources)
1
Technological Institute for Superhard and Novel Carbon Materials
, Troitsk, Moscow 108840 Russia
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N. V. Luparev;
N. V. Luparev
(Resources)
1
Technological Institute for Superhard and Novel Carbon Materials
, Troitsk, Moscow 108840 Russia
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A. V. Golovanov
;
A. V. Golovanov
(Resources, Writing – review & editing)
1
Technological Institute for Superhard and Novel Carbon Materials
, Troitsk, Moscow 108840 Russia
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T. E. Drozdova
;
T. E. Drozdova
(Investigation)
1
Technological Institute for Superhard and Novel Carbon Materials
, Troitsk, Moscow 108840 Russia
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V. D. Blank
V. D. Blank
(Supervision)
1
Technological Institute for Superhard and Novel Carbon Materials
, Troitsk, Moscow 108840 Russia
2
Moscow Institute of Physics and Technology
, Dolgoprudny, Moscow Region 141701 Russia
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a)Author to whom correspondence should be addressed: dmitrii.prikhodko@phystech.edu
Appl. Phys. Lett. 125, 042109 (2024)
Article history
Received:
January 11 2024
Accepted:
July 12 2024
Citation
D. D. Prikhodko, V. O. Timoshenko, S. A. Tarelkin, N. V. Kornilov, N. V. Luparev, A. V. Golovanov, T. E. Drozdova, V. D. Blank; Hall effect analysis of boron and nitrogen background concentration in undoped CVD diamond. Appl. Phys. Lett. 22 July 2024; 125 (4): 042109. https://doi.org/10.1063/5.0197107
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