Catalyst-free in-plane growth of high-quality ultra-thin InSb nanowires

InSb nanowires (NWs) show an important application in topological quantum computing owing to their high electron mobility, strong spin–orbit interaction, and large g factor. Particularly, ultra-thin InSb NWs are expected to be used to solve the problem of multiple sub-band occupation for the detection of Majorana fermions. However, it is still difficult to epitaxially grow ultra-thin InSb NWs due to the surfactant effect of Sb. Here, we develop an in-plane self-assembled technique to grow catalyst-free ultra-thin InSb NWs on Ge(001) substrates by molecular-beam epitaxy. It is found that ultra-thin InSb NWs with a diameter as small as 17 nm can be obtained by this growth manner. More importantly, these NWs have aspect ratios of 40–100. We also find that the in-plane InSb NWs always grow along the [110] and $[11¯0]$ directions, and they have the same {111} facets, which are caused by the lowest-surface energy of {111} crystal planes for NWs grown with a high Sb/In ratio. Detailed structural studies confirm that InSb NWs are high-quality zinc blende crystals, and there is a strict epitaxial relationship between the InSb NW and the Ge substrate. The in-plane InSb NWs have a similar Raman spectral linewidth compared with that of the single-crystal InSb substrate, further confirming their high crystal quality. Our work provides useful insights into the controlled growth of in-plane catalyst-free III–V NWs.