Silicon nitride (Si3N4) photonic integrated circuits are rapidly developing in recent decades. The low loss of Si3N4 attracts significant attention and facilitates a wide range of applications in integrated photonics. In this work, we demonstrate the foundry fabrication of a 300-nm-thick 8-in. wafer-scale Si3N4 platform, with a microresonator intrinsic quality factor of up to , corresponding to an ultralow loss of 2.2 dB/m. Leveraging this platform, we develop a mature process design kit, achieving a single-mode waveguide propagation loss of less than 5 dB/m, an edge coupler loss of 1.3 dB, and an insertion loss of 0.07 dB for multimode interference couplers. Utilizing the processed Si3N4 chip, we realize a hybrid integrated tunable external cavity laser with a tuning range from 1534 to 1602 nm, a record-high side-mode suppression ratio of up to 76 dB, an optical power of 26 mW, and an intrinsic linewidth of down to 314 Hz. Our work lays a solid foundation for the further development of applications, including nonlinear optics, quantum optics, optical communications, and ranging.
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16 September 2024
Research Article|
September 17 2024
300-nm-thick, ultralow-loss silicon nitride photonic integrated circuits by 8-in. foundry production
Xuguang Zhang
;
Xuguang Zhang
(Conceptualization, Data curation, Investigation, Writing – original draft)
1
State Key Laboratory of Advanced Optical Communications System and Networks, School of Electronics, Peking University
, Beijing 100871, China
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Yuxin Liang
;
Yuxin Liang
(Data curation, Writing – review & editing)
2
Chongqing United Microelectronics Center
, Chongqing 401332, China
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Yujun Chen
;
Yujun Chen
(Visualization)
1
State Key Laboratory of Advanced Optical Communications System and Networks, School of Electronics, Peking University
, Beijing 100871, China
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Bitao Shen
;
Bitao Shen
(Formal analysis)
1
State Key Laboratory of Advanced Optical Communications System and Networks, School of Electronics, Peking University
, Beijing 100871, China
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Jiahui Huang
;
Jiahui Huang
(Validation)
1
State Key Laboratory of Advanced Optical Communications System and Networks, School of Electronics, Peking University
, Beijing 100871, China
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Chenghao Lao
;
Chenghao Lao
(Validation)
1
State Key Laboratory of Advanced Optical Communications System and Networks, School of Electronics, Peking University
, Beijing 100871, China
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Yichen Wu
;
Yichen Wu
(Validation)
1
State Key Laboratory of Advanced Optical Communications System and Networks, School of Electronics, Peking University
, Beijing 100871, China
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Zhihui Li
;
Zhihui Li
(Data curation)
2
Chongqing United Microelectronics Center
, Chongqing 401332, China
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Dapeng Liu
;
Dapeng Liu
(Data curation, Funding acquisition)
2
Chongqing United Microelectronics Center
, Chongqing 401332, China
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Haowen Shu
;
Haowen Shu
(Writing – review & editing)
1
State Key Laboratory of Advanced Optical Communications System and Networks, School of Electronics, Peking University
, Beijing 100871, China
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Weiwei Hu;
Weiwei Hu
(Writing – review & editing)
1
State Key Laboratory of Advanced Optical Communications System and Networks, School of Electronics, Peking University
, Beijing 100871, China
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Xingjun Wang
;
Xingjun Wang
(Resources, Supervision)
1
State Key Laboratory of Advanced Optical Communications System and Networks, School of Electronics, Peking University
, Beijing 100871, China
3
Frontiers Science Center for Nano-optoelectronics, Peking University
, Beijing 100871, China
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Naidi Cui;
Naidi Cui
a)
(Resources, Supervision)
2
Chongqing United Microelectronics Center
, Chongqing 401332, China
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Lin Chang
Lin Chang
a)
(Funding acquisition, Resources, Supervision, Writing – review & editing)
1
State Key Laboratory of Advanced Optical Communications System and Networks, School of Electronics, Peking University
, Beijing 100871, China
3
Frontiers Science Center for Nano-optoelectronics, Peking University
, Beijing 100871, China
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Appl. Phys. Lett. 125, 121111 (2024)
Article history
Received:
May 31 2024
Accepted:
August 24 2024
Citation
Xuguang Zhang, Yuxin Liang, Yujun Chen, Bitao Shen, Jiahui Huang, Chenghao Lao, Yichen Wu, Zhihui Li, Dapeng Liu, Haowen Shu, Weiwei Hu, Xingjun Wang, Naidi Cui, Lin Chang; 300-nm-thick, ultralow-loss silicon nitride photonic integrated circuits by 8-in. foundry production. Appl. Phys. Lett. 16 September 2024; 125 (12): 121111. https://doi.org/10.1063/5.0221409
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