The impact of heavy ion irradiation on the β-Ga2O3 p-n diode and its physical mechanism have been studied in this Letter. After the irradiation fluence of 1 × 108 cm−2, it is observed that the electrical performance of the device is significantly degraded. The forward current density (JF) is reduced by 49.4%, the reverse current density (JR) is increased by more than two orders of magnitude, and the breakdown voltage (VBR) is decreased by 30%. Based on the results of the deep-level transient spectroscopy measurement, it is concluded that acceptor-like traps generated with an energy level of EC-0.75 eV in the β-Ga2O3 drift layer dominate the JF degradation of the device, which are most likely related to Ga vacancies. These acceptor-like traps result in the reduction of change carrier concentration, which in turn leads to a decrease in JF. In addition, according to the conductive atomic force microscope measurements and theoretical calculation, it is clearly observed that the latent tracks induced by heavy ion irradiation can act as leakage paths, leading to a significant degradation of JR and VBR.
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9 September 2024
Research Article|
September 09 2024
Study on the electrical performance degradation mechanism of β-Ga2O3 p-n diode under heavy ion radiation
Shaozhong Yue
;
Shaozhong Yue
(Data curation, Formal analysis, Investigation, Software, Validation, Visualization, Writing – original draft)
1
State Key Laboratory of Wide-Bandgap Semiconductor Devices and Integrated Technology, Faculty of Integrated Circuits, Xidian University
, Xi'an 710071, People's Republic of China
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Xuefeng Zheng
;
Xuefeng Zheng
a)
(Conceptualization, Data curation, Formal analysis, Funding acquisition, Investigation, Methodology, Project administration, Resources, Supervision, Validation, Visualization, Writing – original draft)
1
State Key Laboratory of Wide-Bandgap Semiconductor Devices and Integrated Technology, Faculty of Integrated Circuits, Xidian University
, Xi'an 710071, People's Republic of China
a)Author to whom correspondence should be addressed: xfzheng@mail.xidian.edu.cn
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Fang Zhang
;
Fang Zhang
(Formal analysis, Investigation, Software)
1
State Key Laboratory of Wide-Bandgap Semiconductor Devices and Integrated Technology, Faculty of Integrated Circuits, Xidian University
, Xi'an 710071, People's Republic of China
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Danmei Lin
;
Danmei Lin
(Formal analysis, Investigation, Software)
1
State Key Laboratory of Wide-Bandgap Semiconductor Devices and Integrated Technology, Faculty of Integrated Circuits, Xidian University
, Xi'an 710071, People's Republic of China
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Sijie Bu;
Sijie Bu
(Formal analysis, Investigation, Software)
1
State Key Laboratory of Wide-Bandgap Semiconductor Devices and Integrated Technology, Faculty of Integrated Circuits, Xidian University
, Xi'an 710071, People's Republic of China
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Yingzhe Wang;
Yingzhe Wang
(Formal analysis, Investigation, Software)
1
State Key Laboratory of Wide-Bandgap Semiconductor Devices and Integrated Technology, Faculty of Integrated Circuits, Xidian University
, Xi'an 710071, People's Republic of China
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Peipei Hu
;
Peipei Hu
(Formal analysis, Investigation)
2
Institute of Modern Physics, Chinese Academy of Sciences (CAS)
, Lanzhou 730000, China
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Jie Liu
;
Jie Liu
(Investigation)
2
Institute of Modern Physics, Chinese Academy of Sciences (CAS)
, Lanzhou 730000, China
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Weidong Zhang
;
Weidong Zhang
(Writing – original draft)
3
The School of Engineering, Liverpool John Moores University
, Liverpool L3 3AF, United Kingdom
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Jianfu Zhang
;
Jianfu Zhang
(Formal analysis)
3
The School of Engineering, Liverpool John Moores University
, Liverpool L3 3AF, United Kingdom
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Xiaohua Ma;
Xiaohua Ma
(Funding acquisition, Methodology, Supervision)
1
State Key Laboratory of Wide-Bandgap Semiconductor Devices and Integrated Technology, Faculty of Integrated Circuits, Xidian University
, Xi'an 710071, People's Republic of China
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Yue Hao
Yue Hao
(Funding acquisition, Methodology, Supervision)
1
State Key Laboratory of Wide-Bandgap Semiconductor Devices and Integrated Technology, Faculty of Integrated Circuits, Xidian University
, Xi'an 710071, People's Republic of China
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a)Author to whom correspondence should be addressed: xfzheng@mail.xidian.edu.cn
Appl. Phys. Lett. 125, 112101 (2024)
Article history
Received:
July 18 2024
Accepted:
August 26 2024
Citation
Shaozhong Yue, Xuefeng Zheng, Fang Zhang, Danmei Lin, Sijie Bu, Yingzhe Wang, Peipei Hu, Jie Liu, Weidong Zhang, Jianfu Zhang, Xiaohua Ma, Yue Hao; Study on the electrical performance degradation mechanism of β-Ga2O3 p-n diode under heavy ion radiation. Appl. Phys. Lett. 9 September 2024; 125 (11): 112101. https://doi.org/10.1063/5.0229345
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