Currently, in the photovoltaic industry, the market share of n-type monocrystalline silicon is rapidly increasing. However, during mass production, striation defects characterized by concentric circles significantly impact the efficiency of solar cells. In this paper, we investigate the properties and origins of striations in n-type Czochralski silicon solar cells. These striations, occurring in wafers with an oxygen concentration below 7 × 1017 cm−3, are shown to potentially cause an efficiency degradation up to 0.86% absolute. Through an array of techniques, including photoluminescence, optical microscopy (OM), electron beam induced current (EBIC), and Fourier Transform Infrared Spectroscopy, this work demonstrates that such defects primarily form after the thermal treatment processes in the manufacturing of solar cells and indirectly proves that these defects are related to the precipitation behavior of oxygen. Notably, traditional methods of post-polishing and etching followed by OM and EBIC technique failed to detect these defects. Therefore, the indirect characterization methods designed in this study hold significant referential value.
Skip Nav Destination
,
,
,
,
,
,
,
,
,
Article navigation
17 June 2024
Research Article|
June 20 2024
Separated striations in n-type Czochralski silicon solar cells Available to Purchase
Guixiu Li;
Guixiu Li
(Conceptualization, Data curation, Formal analysis, Methodology, Visualization, Writing – original draft)
1
State Key Laboratory of Silicon and Advanced Semiconductor Materials and School of Materials Science and Engineering, Zhejiang University
, Hangzhou 310027, People's Republic of China
2
Shangyu Institute of Semiconductor Materials
, Shaoxing 312300, People's Republic of China
Search for other works by this author on:
Shuai Yuan
;
Shuai Yuan
a)
(Funding acquisition, Project administration, Supervision, Writing – review & editing)
1
State Key Laboratory of Silicon and Advanced Semiconductor Materials and School of Materials Science and Engineering, Zhejiang University
, Hangzhou 310027, People's Republic of China
2
Shangyu Institute of Semiconductor Materials
, Shaoxing 312300, People's Republic of China
Search for other works by this author on:
Shenglang Zhou;
Shenglang Zhou
(Data curation, Investigation, Resources)
3
Jiangsu GCL Silicon Material Technology Development Co., Ltd
, Xuzhou 221000, People's Republic of China
Search for other works by this author on:
Yihua Wu;
Yihua Wu
(Data curation, Investigation, Resources)
3
Jiangsu GCL Silicon Material Technology Development Co., Ltd
, Xuzhou 221000, People's Republic of China
Search for other works by this author on:
Hongrong Chen;
Hongrong Chen
(Investigation, Resources)
3
Jiangsu GCL Silicon Material Technology Development Co., Ltd
, Xuzhou 221000, People's Republic of China
Search for other works by this author on:
Huali Zhang;
Huali Zhang
(Investigation, Project administration)
3
Jiangsu GCL Silicon Material Technology Development Co., Ltd
, Xuzhou 221000, People's Republic of China
Search for other works by this author on:
Chen Wang;
Chen Wang
(Investigation, Project administration)
3
Jiangsu GCL Silicon Material Technology Development Co., Ltd
, Xuzhou 221000, People's Republic of China
Search for other works by this author on:
Lei Wang;
Lei Wang
(Funding acquisition, Supervision)
1
State Key Laboratory of Silicon and Advanced Semiconductor Materials and School of Materials Science and Engineering, Zhejiang University
, Hangzhou 310027, People's Republic of China
Search for other works by this author on:
Xuegong Yu
;
Xuegong Yu
a)
(Funding acquisition, Supervision)
1
State Key Laboratory of Silicon and Advanced Semiconductor Materials and School of Materials Science and Engineering, Zhejiang University
, Hangzhou 310027, People's Republic of China
Search for other works by this author on:
Deren Yang
Deren Yang
(Funding acquisition, Project administration, Supervision, Writing – review & editing)
1
State Key Laboratory of Silicon and Advanced Semiconductor Materials and School of Materials Science and Engineering, Zhejiang University
, Hangzhou 310027, People's Republic of China
2
Shangyu Institute of Semiconductor Materials
, Shaoxing 312300, People's Republic of China
Search for other works by this author on:
Guixiu Li
1,2
Shuai Yuan
1,2,a)
Shenglang Zhou
3
Yihua Wu
3
Hongrong Chen
3
Huali Zhang
3
Chen Wang
3
Lei Wang
1
Xuegong Yu
1,a)
Deren Yang
1,2
1
State Key Laboratory of Silicon and Advanced Semiconductor Materials and School of Materials Science and Engineering, Zhejiang University
, Hangzhou 310027, People's Republic of China
2
Shangyu Institute of Semiconductor Materials
, Shaoxing 312300, People's Republic of China
3
Jiangsu GCL Silicon Material Technology Development Co., Ltd
, Xuzhou 221000, People's Republic of China
Appl. Phys. Lett. 124, 252103 (2024)
Article history
Received:
February 21 2024
Accepted:
June 11 2024
Citation
Guixiu Li, Shuai Yuan, Shenglang Zhou, Yihua Wu, Hongrong Chen, Huali Zhang, Chen Wang, Lei Wang, Xuegong Yu, Deren Yang; Separated striations in n-type Czochralski silicon solar cells. Appl. Phys. Lett. 17 June 2024; 124 (25): 252103. https://doi.org/10.1063/5.0204270
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
Attosecond physics and technology
O. Alexander, D. Ayuso, et al.
Significant improvement of breakdown voltage of Al0.86Ga0.14N Schottky barrier diodes by atomic layer etching
Tingang Liu, Zhiyuan Liu, et al.
Roadmap on photonic metasurfaces
Sebastian A. Schulz, Rupert. F. Oulton, et al.
Related Content
Comments on the distinction between ``striations'' and ``swirls'' in silicon
Appl. Phys. Lett. (July 1974)
Investigation of defects and striations in as‐grown Si crystals by SEM using Schottky diodes
Appl. Phys. Lett. (September 1975)
Striations on Copper Single Crystals Subjected to Torsional Fatigue. II. On the Mechanism of Fatigue Striation Formation and Fatigue Failure at Low Strain Amplitudes
J. Appl. Phys. (March 1967)
Origin of Striations Due to Mechanical Effects in Fast Wire Explosions
J. Appl. Phys. (September 1970)