In this work, we propose combining a low work function anode metal and junction barrier Schottky structure to simultaneously achieve low turn-on voltage (Von) and high breakdown voltage (BV), which alleviates the dilemma that high BV requires high Schottky barrier height (SBH) and high Von. Molybdenum (Mo) is used to serve as the anode metal to reduce the SBH and facilitate fast turn-on to achieve a low Von. To resolve the low SBH related low BV issue, a p-NiO/n-Ga2O3-based heterojunction structure is used to enhance β-Ga2O3 sidewall depletion during the reverse state to improve the BV. With such a design, a low Von = 0.64 V(@1A/cm2) and a high BV = 2.34 kV as well as a specific on-resistance (Ron,sp) of 5.3 mΩ cm2 are demonstrated on a 10 μm-drift layer with a doping concentration of 1.5 × 1016 cm−3. β-Ga2O3 JBS diodes with low Von = 0.64 V and a power figure of merit of 1.03 GW/cm2 show great potential for future high-voltage and high-efficiency power electronics.
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22 April 2024
Research Article|
April 24 2024
Low turn-on voltage and 2.3 kV β-Ga2O3 heterojunction barrier Schottky diodes with Mo anode
Chunxu Su
;
Chunxu Su
(Data curation, Investigation, Writing – original draft)
1
National Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University
, Xi'an 710071, China
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Hong Zhou
;
Hong Zhou
a)
(Supervision)
1
National Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University
, Xi'an 710071, China
2
Guangzhou Wide Bandgap Semiconductor Innovation Center, Guangzhou Institute of Technology, Xidian University
, Guangzhou 510555, China
a)Authors to whom correspondence should be addressed: [email protected]; [email protected]; and [email protected]
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Kun Zhang
;
Kun Zhang
(Software)
1
National Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University
, Xi'an 710071, China
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Chenlu Wang
;
Chenlu Wang
(Investigation)
1
National Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University
, Xi'an 710071, China
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Sihan Sun;
Sihan Sun
(Software)
1
National Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University
, Xi'an 710071, China
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Hehe Gong
;
Hehe Gong
(Data curation)
3
School of Electronic Science and Engineering, Nanjing University
, Nanjing 210023, China
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Jiandong Ye
;
Jiandong Ye
(Project administration)
3
School of Electronic Science and Engineering, Nanjing University
, Nanjing 210023, China
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Zhihong Liu;
Zhihong Liu
(Supervision)
1
National Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University
, Xi'an 710071, China
2
Guangzhou Wide Bandgap Semiconductor Innovation Center, Guangzhou Institute of Technology, Xidian University
, Guangzhou 510555, China
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Kui Dang;
Kui Dang
(Supervision)
1
National Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University
, Xi'an 710071, China
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Zheyuan Hu
;
Zheyuan Hu
(Investigation)
5
Nanofabrication Facility, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences
, Suzhou 215123, China
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Xiaodong Zhang
;
Xiaodong Zhang
(Validation)
5
Nanofabrication Facility, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences
, Suzhou 215123, China
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Jie Wei
;
Jie Wei
(Data curation)
4
State Key Laboratory of Electronic Thin Films and Integrated devices, University of Electronic Science and Technology of China
, Chengdu 610054, China
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Xiaorong Luo
;
Xiaorong Luo
a)
(Supervision)
4
State Key Laboratory of Electronic Thin Films and Integrated devices, University of Electronic Science and Technology of China
, Chengdu 610054, China
a)Authors to whom correspondence should be addressed: [email protected]; [email protected]; and [email protected]
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Jincheng Zhang;
Jincheng Zhang
a)
(Supervision)
1
National Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University
, Xi'an 710071, China
2
Guangzhou Wide Bandgap Semiconductor Innovation Center, Guangzhou Institute of Technology, Xidian University
, Guangzhou 510555, China
a)Authors to whom correspondence should be addressed: [email protected]; [email protected]; and [email protected]
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Rong Zhang
;
Rong Zhang
(Supervision)
3
School of Electronic Science and Engineering, Nanjing University
, Nanjing 210023, China
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Yue Hao
Yue Hao
(Supervision)
1
National Key Laboratory of Wide Bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University
, Xi'an 710071, China
2
Guangzhou Wide Bandgap Semiconductor Innovation Center, Guangzhou Institute of Technology, Xidian University
, Guangzhou 510555, China
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a)Authors to whom correspondence should be addressed: [email protected]; [email protected]; and [email protected]
Appl. Phys. Lett. 124, 173506 (2024)
Article history
Received:
December 01 2023
Accepted:
March 29 2024
Citation
Chunxu Su, Hong Zhou, Kun Zhang, Chenlu Wang, Sihan Sun, Hehe Gong, Jiandong Ye, Zhihong Liu, Kui Dang, Zheyuan Hu, Xiaodong Zhang, Jie Wei, Xiaorong Luo, Jincheng Zhang, Rong Zhang, Yue Hao; Low turn-on voltage and 2.3 kV β-Ga2O3 heterojunction barrier Schottky diodes with Mo anode. Appl. Phys. Lett. 22 April 2024; 124 (17): 173506. https://doi.org/10.1063/5.0189890
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