In this work, fine carrier transport and recombination processes in p-NiO gate AlGaN/GaN high electron mobility transistors were investigated by analyzing their electroluminescence under forward gate bias, with photoluminescence spectrum as a reference. Red luminescence with a peak of 1.9 eV was captured when the gate bias voltage exceeded 4 V, which was verified to originate from the tunneling enhanced interface recombination of injected holes from the gate metal and spilled electrons from the 2DEG channel at the type-II band aligned p-NiO/AlGaN heterostructure interface. Under higher gate bias voltage, holes were further injected into the GaN buffer layer, producing ultraviolet luminescence and yellow luminescence, corresponding respectively to the band edge emission and defect-assisted radiative recombination of GaN. Threshold voltage shift measurements under forward gate bias were conducted to further investigate the carrier transport and recombination processes.

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