Next generation EUV sources for photolithography use light produced by laser-produced plasmas (LPP) from ablated tin droplets. A major challenge for extending the lifetime of these devices is mitigating damage caused by deposition of tin debris on the sensitive collection mirror. Especially difficult to stop are high energy (up to 10 keV) highly charged tin ions created in the plasma. Existing solutions include the use of stopping gas, electric fields, and magnetic fields. One common configuration consists of a magnetic field perpendicular to the EUV emission direction, but such a system can result in ion populations that are trapped rather than removed. We investigate a previously unconsidered mitigation geometry consisting of a magnetic null by performing full-orbit integration of the ion trajectories in an EUV system with realistic dimensions and optimize the coil locations for the null configuration. The magnetic null prevents a fraction of ions from hitting the mirror comparable to that of the perpendicular field, but does not trap any ions due to the chaotic nature of ion trajectories that pass close to the null. This technology can potentially improve LPP-based EUV photolithography system efficiency and lifetime and may allow for a different, more efficient formulation of buffer gas.
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24 July 2023
Research Article|
July 27 2023
EUV debris mitigation using magnetic nulls
Special Collection:
Plasma Sources for Advanced Semiconductor Applications
B. Y. Israeli
;
B. Y. Israeli
a)
(Conceptualization, Data curation, Software, Writing – original draft, Writing – review & editing)
1
Princeton Plasma Physics Laboratory
, Princeton, New Jersey 08540, USA
2
Princeton University
, Princeton, New Jersey 08544, USA
a)Author to whom correspondence should be addressed: bisraeli@pppl.gov
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C. B. Smiet
;
C. B. Smiet
(Conceptualization, Software, Writing – original draft, Writing – review & editing)
1
Princeton Plasma Physics Laboratory
, Princeton, New Jersey 08540, USA
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M. Simeni Simeni
;
M. Simeni Simeni
(Data curation, Writing – original draft, Writing – review & editing)
1
Princeton Plasma Physics Laboratory
, Princeton, New Jersey 08540, USA
3
Department of Mechanical Engineering, University of Minnesota
, Minneapolis, Minnesota 55455, USA
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A. Diallo
A. Diallo
(Conceptualization, Data curation, Funding acquisition, Writing – original draft, Writing – review & editing)
1
Princeton Plasma Physics Laboratory
, Princeton, New Jersey 08540, USA
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a)Author to whom correspondence should be addressed: bisraeli@pppl.gov
Appl. Phys. Lett. 123, 043507 (2023)
Article history
Received:
March 27 2023
Accepted:
July 18 2023
Citation
B. Y. Israeli, C. B. Smiet, M. Simeni Simeni, A. Diallo; EUV debris mitigation using magnetic nulls. Appl. Phys. Lett. 24 July 2023; 123 (4): 043507. https://doi.org/10.1063/5.0152083
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