Studies were conducted on epitaxial VO2 thin films to assess to the effect of remote epitaxy on the metal–insulator transition (MIT). The epitaxial VO2 heterostructures were synthesized on both bare Al2O3 (0001) substrates and Al2O3 substrates coated with two monolayer-thick graphene. While both systems exhibit the MIT, the film grown by remote epitaxy on graphene demonstrates improved transport properties. Electrical transport measurements show that the on/off ratio is enhanced by a factor of ∼7.5 and the switching temperature window is narrower for VO2 thin films grown on graphene. By characterizing the heterostructures with a suite of structural, chemical, and spectroscopic tools, we find that the graphene interlayer inhibits oxygen vacancy diffusion from Al2O3 (0001) during the VO2 growth, resulting in improved electrical behavior at the MIT.
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22 August 2022
Research Article|
August 22 2022
Enhancing the metal–insulator transition in VO2 heterostructures with graphene interlayers
Special Collection:
Metal Oxide Thin-Film Electronics
Hui Cao
;
Hui Cao
(Data curation, Writing – original draft)
1
Materials Science Division, Argonne National Laboratory
, Lemont, Illinois 60439, USA
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Xi Yan
;
Xi Yan
(Data curation)
1
Materials Science Division, Argonne National Laboratory
, Lemont, Illinois 60439, USA
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Yan Li
;
Yan Li
(Data curation)
1
Materials Science Division, Argonne National Laboratory
, Lemont, Illinois 60439, USA
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Liliana Stan
;
Liliana Stan
(Data curation, Writing – review & editing)
2
Center for Nanoscale Materials, Argonne National Laboratory
, Lemont, Illinois 60439, USA
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Wei Chen
;
Wei Chen
(Writing – review & editing)
1
Materials Science Division, Argonne National Laboratory
, Lemont, Illinois 60439, USA
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Nathan P. Guisinger
;
Nathan P. Guisinger
(Writing – review & editing)
2
Center for Nanoscale Materials, Argonne National Laboratory
, Lemont, Illinois 60439, USA
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Hua Zhou
;
Hua Zhou
a)
(Conceptualization, Writing – review & editing)
3
Advanced Photon Source, Argonne National Laboratory
, Lemont, Illinois 60439, USA
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Dillon D. Fong
Dillon D. Fong
a)
(Conceptualization, Writing – review & editing)
1
Materials Science Division, Argonne National Laboratory
, Lemont, Illinois 60439, USA
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Note: This paper is part of the APL Special Collection on Metal Oxide Thin-Film Electronics.
Appl. Phys. Lett. 121, 081601 (2022)
Article history
Received:
May 24 2022
Accepted:
August 05 2022
Citation
Hui Cao, Xi Yan, Yan Li, Liliana Stan, Wei Chen, Nathan P. Guisinger, Hua Zhou, Dillon D. Fong; Enhancing the metal–insulator transition in VO2 heterostructures with graphene interlayers. Appl. Phys. Lett. 22 August 2022; 121 (8): 081601. https://doi.org/10.1063/5.0100493
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