Ultrathin light absorbers present a viable route toward improving the specific detectivity and response time of microbolometers. However, for an ultrathin film to absorb light efficiently, the dielectric function of the film and its thickness must satisfy strict requirements. We experimentally demonstrate an average absorptance of 48% ± 2.5% in the 8–13 μm (769–1250 cm−1) spectral range for 10 nm thick titanium nitride (TiN), a value bordering on the 50% fundamental absorptance limit for a suspended thin film. The heat capacity per unit area of this absorber is only 1.2 × 10−6 J/K/cm2, which is beneficial for improving the response time of a microfabricated bolometer. We also show that a sufficient condition for reaching maximal absorption in an ultrathin film is that ε″ ≫ |ε′|.
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5 December 2022
Research Article|
December 06 2022
Maximal absorption in ultrathin TiN films for microbolometer applications
Special Collection:
Thermal Radiation at the Nanoscale and Applications
Ting S. Luk
;
Ting S. Luk
a)
(Conceptualization, Data curation, Formal analysis, Investigation, Writing – original draft, Writing – review & editing)
1
Center for Integrated Nanotechnologies, Sandia National Laboratories
, Albuquerque, New Mexico 87185, USA
a)Author to whom correspondence should be addressed: tsluk@sandia.gov
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Guangping Xu;
Guangping Xu
(Resources, Writing – review & editing)
2
Geochemistry Department, Sandia National Laboratories
, Albuquerque, New Mexico 87185, USA
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Willard Ross;
Willard Ross
(Resources)
1
Center for Integrated Nanotechnologies, Sandia National Laboratories
, Albuquerque, New Mexico 87185, USA
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John N. Nogan
;
John N. Nogan
(Resources)
1
Center for Integrated Nanotechnologies, Sandia National Laboratories
, Albuquerque, New Mexico 87185, USA
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Ethan A. Scott
;
Ethan A. Scott
(Resources, Visualization, Writing – review & editing)
1
Center for Integrated Nanotechnologies, Sandia National Laboratories
, Albuquerque, New Mexico 87185, USA
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Sergei Ivanov
;
Sergei Ivanov
(Resources)
1
Center for Integrated Nanotechnologies, Sandia National Laboratories
, Albuquerque, New Mexico 87185, USA
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Oana Niculescu
;
Oana Niculescu
(Formal analysis, Resources)
3
Department of Engineering, University of Cambridge
, Cambridge, Cambridgeshire CB3 0FA, United Kingdom
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Oleg Mitrofanov
;
Oleg Mitrofanov
(Formal analysis, Writing – review & editing)
4
Electronic and Electrical Engineering Department, University College London
, London WC1E 7JE, United Kingdom
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C. Thomas Harris
C. Thomas Harris
(Conceptualization, Funding acquisition, Investigation, Supervision, Writing – original draft, Writing – review & editing)
1
Center for Integrated Nanotechnologies, Sandia National Laboratories
, Albuquerque, New Mexico 87185, USA
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a)Author to whom correspondence should be addressed: tsluk@sandia.gov
Note: This paper is part of the APL Special Collection on Thermal Radiation at the Nanoscale and Applications.
Appl. Phys. Lett. 121, 234101 (2022)
Article history
Received:
August 31 2022
Accepted:
November 23 2022
Citation
Ting S. Luk, Guangping Xu, Willard Ross, John N. Nogan, Ethan A. Scott, Sergei Ivanov, Oana Niculescu, Oleg Mitrofanov, C. Thomas Harris; Maximal absorption in ultrathin TiN films for microbolometer applications. Appl. Phys. Lett. 5 December 2022; 121 (23): 234101. https://doi.org/10.1063/5.0123671
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