Topological insulators (TIs) are promising for spin–orbit torque (SOT) switching thanks to their giant spin Hall angle. SOT switching using TIs has been studied so far in the thermal activation regime by direct currents or relatively long pulse currents (≥10 ns). In this work, we studied SOT magnetization switching of (Pt/Co) multilayers with strong perpendicular magnetic anisotropy by the BiSb topological insulator in both thermal activation and fast switching regime with pulse width down to 1 ns. We reveal that the zero-Kelvin threshold switching current density Jth0BiSb is 2.5 × 106 and 4.1 × 106 A/cm2 for the thermal activation regime and fast switching regime in a 800 nm-wide Hall bar device via domain wall depining. From time-resolved measurements using 1 ns pulses, we find that the domain wall velocity is 430–470 m/s at JBiSb = 1.6 × 107–1.7 × 107 A/cm2. Our work demonstrates the potential of the BiSb thin film for ultralow power and fast operation of SOT-based spintronic devices.

1.
M. T.
Chang
,
P.
Rosenfeld
,
S. L.
Lu
, and
B.
Jacob
, in
IEEE 19th International Symposium on High Performance Computer Architecture
(
IEEE Computer Society
,
2013
), pp.
143
154
.
2.
W. S.
Zhao
,
Y.
Zhang
,
T.
Devolder
,
J. O.
Klein
,
D.
Ravelosona
,
C.
Chappert
, and
P.
Mazoyer
,
Microelectron. Reliab.
52
,
1848
(
2012
).
3.
L.
Liu
,
C. F.
Pai
,
Y.
Li
,
H. W.
Tseng
,
D. C.
Ralph
, and
R. A.
Buhrman
,
Science
336
,
555
(
2012
).
4.
M.
Cubukcu
,
O.
Boulle
,
M.
Drouard
 et al.,
Appl. Phys. Lett.
104
,
042406
(
2014
).
5.
S.
Fukami
,
T.
Anekawa
,
C.
Zhang
, and
H.
Ohno
,
Nat. Nanotechnol.
11
,
621
(
2016
).
6.
K.
Garello
,
C. O.
Avci
,
I. M.
Miron
 et al.,
Appl. Phys. Lett.
105
,
212402
(
2014
).
7.
C.
Zhang
,
S.
Fukami
,
H.
Sato
,
F.
Matsukura
, and
H.
Ohno
,
Appl. Phys. Lett.
107
,
012401
(
2015
).
8.
E.
Grimaldi
,
V.
Krizakova
,
G.
Sala
 et al.,
Nat. Nanotechnol.
15
,
111
(
2020
).
9.
S.
Shi
,
Y.
Ou
,
S.  V.
Aradhya
 et al.,
Phys. Rev. Appl.
9
,
011002
(
2018
).
10.
L.
Zhu
,
L.
Zhu
,
S.
Shi
 et al.,
Phys. Rev. Appl.
11
,
061004
(
2019
).
11.
L.
Zhu
,
L.
Zhu
,
S.
Shi
 et al.,
Adv. Electron. Mater.
6
,
1901131
(
2020
).
12.
Z.
Zhao
,
M.
Jamali
,
A. K.
Smith
 et al.,
Appl. Phys. Lett.
106
,
132404
(
2015
).
13.
L.
Zhu
,
D. C.
Ralph
, and
R. A.
Buhrman
,
Phys. Rev. Appl.
15
,
024059
(
2021
).
14.
A. R.
Mellnik
,
J. S.
Lee
,
A.
Richardella
 et al.,
Nature
511
,
449
(
2014
).
15.
Y.
Fan
,
P.
Upadhyaya
,
X.
Kou
 et al.,
Nat. Mater.
13
,
699
(
2014
).
16.
P. N.
Hai
,
J. Magn. Soc. Jpn.
44
,
137
(
2020
).
17.
Y.
Wang
,
D.
Zhu
,
Y.
Wu
 et al.,
Nat. Commun.
8
,
1364
(
2017
).
18.
J.
Han
,
A.
Richardella
,
S. A.
Siddiqui
,
J.
Finley
,
N.
Samarth
, and
L.
Liu
,
Phys. Rev. Lett.
119
,
077702
(
2017
).
19.
H.
Wu
,
P.
Zhang
,
P.
Deng
 et al.,
Phys. Rev. Lett.
123
,
207205
(
2019
).
20.
T.
Chen
,
C.
Peng
,
T.
Tsai
,
W.
Liao
,
C.
Wu
,
H.
Yen
, and
C.
Pai
,
ACS Appl. Mater. Interfaces
12
,
7788
(
2020
).
21.
N. H. D.
Khang
,
Y.
Ueda
, and
P. N.
Hai
,
Nat. Mater.
17
,
808
(
2018
).
22.
N. H. D.
Khang
,
S.
Nakano
,
T.
Shirokura
,
Y.
Miyamoto
, and
P. N.
Hai
,
Sci. Rep.
10
,
12185
(
2020
).
23.
Y.
Ueda
,
N. H. D.
Khang
,
K.
Yao
, and
P. N.
Hai
,
Appl. Phys. Lett.
110
,
062401
(
2017
).
24.
X.
Li
,
S.
Lin
,
D. C.
Mahendra
 et al.,
IEEE J. Electron Devices Soc.
8
,
674
(
2020
).
25.
T.
Fan
,
M.
Tobah
,
T.
Shirokura
,
N. H. D.
Khang
, and
P. N.
Hai
,
Jpn. J. Appl. Phys.
59
,
063001
(
2020
).
26.
T.
Fan
,
N. H. D.
Khang
,
T.
Shirokura
,
H. H.
Huy
, and
P. N.
Hai
,
Appl. Phys. Lett.
119
,
082403
(
2021
).
27.
T.
Fan
,
N. H. D.
Khang
,
S.
Nakano
, and
P. N.
Hai
,
Sci. Rep.
12
,
2998
(
2022
).
28.
H.
Sato
,
M.
Yamanouchi
,
K.
Miura
,
S.
Ikeda
,
R.
Koizumi
,
F.
Matsukura
, and
H.
Ohno
,
IEEE Magn. Lett.
3
,
3000204
(
2012
).
29.
K.-S.
Ryu
,
L.
Thomas
,
S.-H.
Yang
, and
S.
Parkin
,
Nat. Nanotechnol.
8
,
527
(
2013
).
30.
H.
Huang
,
H.
Wu
,
T.
Yu
 et al.,
Appl. Phys. Lett.
118
,
072405
(
2021
).
31.
H.
Wang
,
C.
Du
,
C.
Hammel
, and
F.
Yang
,
Phys. Rev. Lett.
113
,
097202
(
2014
).
32.
W.
Lin
,
K.
Chen
,
S.
Zhang
, and
C.  L.
Chien
,
Phys. Rev. Lett.
116
,
186601
(
2016
).
33.
L.
Zhu
,
L.
Zhu
, and
R. A.
Buhrman
,
Phys. Rev. Lett.
126
,
107204
(
2021
).
34.
H.
Wang
,
J.
Finley
,
P.
Zhang
,
J.
Han
,
J. T.
Hou
, and
L.
Liu
,
Phys. Rev. Appl.
11
,
044070
(
2019
).
35.
K.
Garello
,
F.
Yasin
,
H.
Hody
 et al., in
2019 Symposium on VLSI Circuits
(
IEEE
,
2019
), pp.
T194
T195
36.
B.
York
,
P.
Hai
,
Q.
Le
 et al., in
2021 IEEE 32nd Magnetic Recording Conference (TMRC)
(
IEEE
,
2021
), pp.
1
2
.
37.
J.
Sasaki
,
H. H.
Huy
,
N. H. D.
Khang
 et al.,
IEEE Trans. Magn.
58
,
3200404
(
2022
).

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