Future generations of magnetic random access memory demand magnetic tunnel junctions that can provide simultaneously high magnetoresistance, strong retention, low switching energy, and small cell size below 10 nm. Here, we study perpendicular magnetic tunnel junctions with composite free layers, where multiple ferromagnet/nonmagnet interfaces can contribute to the thermal stability. Different nonmagnetic materials (MgO, Ta, and Mo) have been employed as the coupling layers in these multi-interface free layers. The evolution of junction properties under different annealing conditions is investigated. A strong dependence of the tunneling magnetoresistance on the thickness of the first CoFeB layer has been observed. In junctions where Mo and MgO are used as coupling layers, a large tunneling magnetoresistance above 200% has been achieved after 400 °C annealing.
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13 December 2021
Research Article|
December 15 2021
Perpendicular magnetic tunnel junctions with multi-interface free layer

Pravin Khanal;
Pravin Khanal
1
Department of Physics, University of Arizona
, Tucson, Arizona 85721, USA
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Bowei Zhou;
Bowei Zhou
1
Department of Physics, University of Arizona
, Tucson, Arizona 85721, USA
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Magda Andrade;
Magda Andrade
1
Department of Physics, University of Arizona
, Tucson, Arizona 85721, USA
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Yanliu Dang;
Yanliu Dang
2
Materials Science and Engineering Division, National Institute of Standards and Technology
, Gaithersburg, Maryland 20899, USA
3
Department of Electrical & Computer Engineering, Purdue University
, West Lafayette, Indiana 47907, USA
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Albert Davydov;
Albert Davydov
2
Materials Science and Engineering Division, National Institute of Standards and Technology
, Gaithersburg, Maryland 20899, USA
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Ali Habiboglu;
Ali Habiboglu
1
Department of Physics, University of Arizona
, Tucson, Arizona 85721, USA
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Jonah Saidian;
Jonah Saidian
1
Department of Physics, University of Arizona
, Tucson, Arizona 85721, USA
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Adam Laurie;
Adam Laurie
1
Department of Physics, University of Arizona
, Tucson, Arizona 85721, USA
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Jian-Ping Wang
;
Jian-Ping Wang
4
Department of Electrical and Computer Engineering, University of Minnesota
, Minneapolis, Minnesota 55455, USA
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Daniel B Gopman
;
Daniel B Gopman
2
Materials Science and Engineering Division, National Institute of Standards and Technology
, Gaithersburg, Maryland 20899, USA
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Weigang Wang
Weigang Wang
a)
1
Department of Physics, University of Arizona
, Tucson, Arizona 85721, USA
a)Author to whom correspondence should be addressed: [email protected]
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Pravin Khanal
1
Bowei Zhou
1
Magda Andrade
1
Yanliu Dang
2,3
Albert Davydov
2
Ali Habiboglu
1
Jonah Saidian
1
Adam Laurie
1
Jian-Ping Wang
4
Daniel B Gopman
2
Weigang Wang
1,a)
1
Department of Physics, University of Arizona
, Tucson, Arizona 85721, USA
2
Materials Science and Engineering Division, National Institute of Standards and Technology
, Gaithersburg, Maryland 20899, USA
3
Department of Electrical & Computer Engineering, Purdue University
, West Lafayette, Indiana 47907, USA
4
Department of Electrical and Computer Engineering, University of Minnesota
, Minneapolis, Minnesota 55455, USA
a)Author to whom correspondence should be addressed: [email protected]
Appl. Phys. Lett. 119, 242404 (2021)
Article history
Received:
August 12 2021
Accepted:
November 29 2021
Connected Content
A companion article has been published:
Using a layered approach to increase magnetoresistance in MRAM junctions
Citation
Pravin Khanal, Bowei Zhou, Magda Andrade, Yanliu Dang, Albert Davydov, Ali Habiboglu, Jonah Saidian, Adam Laurie, Jian-Ping Wang, Daniel B Gopman, Weigang Wang; Perpendicular magnetic tunnel junctions with multi-interface free layer. Appl. Phys. Lett. 13 December 2021; 119 (24): 242404. https://doi.org/10.1063/5.0066782
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