We achieved substantially low thermal conductivity by introducing some crystal disorder into complex material BaSi2 films on Si substrates for realization of a high-performance thermoelectric material. The BaSi2 films/Si exhibited a low thermal conductivity of 0.96 W m−1 K−1 without nanostructuring, which is less than about two-thirds value of bulk BaSi2 and is the lowest among ecofriendly silicide materials. This substantially low thermal conductivity was brought by both the use of complex material with intrinsically low phonon group velocity and the introduction of point defects as the crystal disorder. The first-principles calculations revealed that the point defect modulates the phonon dispersion relation lowering longitudinal acoustic phonon group velocity. However, the transverse acoustic phonon group velocity was increased at the same time, resulting in a negligible change in average acoustic phonon group velocity. This indicated that the crystal disorder effect related to point defects in this system is enhancement of phonon scattering, not lowering phonon group velocity. The BaSi2 films/Si with point defects exhibited a higher thermoelectric power factor (2.9 μW cm−1 K−2) than bulk BaSi2. These results highlight that complex material BaSi2 film/Si with point defects, having substantially low thermal conductivity, is a candidate as a thermoelectric power generator material in the sensor network.
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4 October 2021
Research Article|
October 04 2021
Low thermal conductivity of complex thermoelectric barium silicide film epitaxially grown on Si Available to Purchase
Takafumi Ishibe
;
Takafumi Ishibe
1
Graduate School of Engineering Science, Osaka University
, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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Jinichiro Chikada;
Jinichiro Chikada
1
Graduate School of Engineering Science, Osaka University
, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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Tsukasa Terada;
Tsukasa Terada
1
Graduate School of Engineering Science, Osaka University
, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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Yuki Komatsubara
;
Yuki Komatsubara
1
Graduate School of Engineering Science, Osaka University
, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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Reona Kitaura;
Reona Kitaura
1
Graduate School of Engineering Science, Osaka University
, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
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Suguru Yachi;
Suguru Yachi
2
Institute of Applied Physics, University of Tsukuba
, Tsukuba, Ibaraki 305-8573, Japan
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Yudai Yamashita
;
Yudai Yamashita
2
Institute of Applied Physics, University of Tsukuba
, Tsukuba, Ibaraki 305-8573, Japan
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Takuma Sato;
Takuma Sato
2
Institute of Applied Physics, University of Tsukuba
, Tsukuba, Ibaraki 305-8573, Japan
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Takashi Suemasu
;
Takashi Suemasu
2
Institute of Applied Physics, University of Tsukuba
, Tsukuba, Ibaraki 305-8573, Japan
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Yoshiaki Nakamura
Yoshiaki Nakamura
a)
1
Graduate School of Engineering Science, Osaka University
, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
a)Author to whom correspondence should be addressed: [email protected]
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Takafumi Ishibe
1
Jinichiro Chikada
1
Tsukasa Terada
1
Yuki Komatsubara
1
Reona Kitaura
1
Suguru Yachi
2
Yudai Yamashita
2
Takuma Sato
2
Takashi Suemasu
2
Yoshiaki Nakamura
1,a)
1
Graduate School of Engineering Science, Osaka University
, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan
2
Institute of Applied Physics, University of Tsukuba
, Tsukuba, Ibaraki 305-8573, Japan
a)Author to whom correspondence should be addressed: [email protected]
Appl. Phys. Lett. 119, 141603 (2021)
Article history
Received:
July 15 2021
Accepted:
September 15 2021
Citation
Takafumi Ishibe, Jinichiro Chikada, Tsukasa Terada, Yuki Komatsubara, Reona Kitaura, Suguru Yachi, Yudai Yamashita, Takuma Sato, Takashi Suemasu, Yoshiaki Nakamura; Low thermal conductivity of complex thermoelectric barium silicide film epitaxially grown on Si. Appl. Phys. Lett. 4 October 2021; 119 (14): 141603. https://doi.org/10.1063/5.0063531
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