Metal-insulator transition (MIT), an intriguing correlated phenomenon induced by the subtle competition of the electrons' repulsive Coulomb interaction and kinetic energy, is of great potential use for electronic applications due to the dramatic change in resistivity. Here, we demonstrate a reversible control of MIT in VO2 films via oxygen stoichiometry engineering. By facilely depositing and dissolving a water-soluble yet oxygen-active Sr3Al2O6 capping layer atop VO2 at room temperature, oxygen ions can reversibly migrate between VO2 and Sr3Al2O6, resulting in a gradual suppression and a complete recovery of MIT in VO2. The migration of the oxygen ions is evidenced in a combination of transport measurement, structural characterization, and first-principles calculations. This approach of chemically induced oxygen migration using a water-dissolvable adjacent layer could be useful for advanced electronic and iontronic devices and studying oxygen stoichiometry effects on the MIT.
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27 September 2021
Research Article|
September 27 2021
Reversible modulation of metal–insulator transition in VO2 via chemically induced oxygen migration
Kun Han;
Kun Han
1
Information Materials and Intelligent Sensing Laboratory of Anhui Province, Institutes of Physical Science and Information Technology, Anhui University
, Hefei 230601, China
2
Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University
, 21 Nanyang Link, 637371 Singapore, Singapore
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Hanyu Wang;
Hanyu Wang
a)
3
Center for Quantum Transport and Thermal Energy Science (CQTES), School of Physics and Technology, Nanjing Normal University
, Nanjing 210023, China
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Liang Wu
;
Liang Wu
b)
4
Faculty of Material Science and Engineering, Kunming University of Science and Technology
, Kunming, Yunnan 650093, China
5
Foshan (Southern China) Institute for New Materials
, Foshan 528247, China
b)Authors to whom correspondence should be addressed: liangwu@kust.edu.cn; lixiao@njnu.edu.cn; and renshaw@ntu.edu.sg
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Yu Cao;
Yu Cao
6
Department of Electrical and Computer Engineering, National University of Singapore
, 4 Engineering Drive 3, 117583 Singapore, Singapore
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Dong-Chen Qi
;
Dong-Chen Qi
7
Centre for Materials Science, School of Chemistry and Physics, Queensland University of Technology
, Brisbane, Queensland 4001, Australia
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Changjian Li
;
Changjian Li
8
Department of Materials Science and Engineering, Southern University of Science and Technology
, Shenzhen, Guangdong 518055, China
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Zhen Huang
;
Zhen Huang
1
Information Materials and Intelligent Sensing Laboratory of Anhui Province, Institutes of Physical Science and Information Technology, Anhui University
, Hefei 230601, China
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Xiao Li;
Xiao Li
b)
3
Center for Quantum Transport and Thermal Energy Science (CQTES), School of Physics and Technology, Nanjing Normal University
, Nanjing 210023, China
b)Authors to whom correspondence should be addressed: liangwu@kust.edu.cn; lixiao@njnu.edu.cn; and renshaw@ntu.edu.sg
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X. Renshaw Wang
X. Renshaw Wang
b)
2
Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University
, 21 Nanyang Link, 637371 Singapore, Singapore
9
School of Electrical and Electronic Engineering, Nanyang Technological University
, 50 Nanyang Ave., 639798 Singapore, Singapore
b)Authors to whom correspondence should be addressed: liangwu@kust.edu.cn; lixiao@njnu.edu.cn; and renshaw@ntu.edu.sg
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a)
Current addresses: Key Laboratory of Materials Physics, Institute of Solid State Physics, HFIPS, Chinese Academy of Science, Hefei 230031, China and Science Island Branch of the Graduate School, University of Science and Technology of China, Hefei 230026, China.
b)Authors to whom correspondence should be addressed: liangwu@kust.edu.cn; lixiao@njnu.edu.cn; and renshaw@ntu.edu.sg
Appl. Phys. Lett. 119, 133102 (2021)
Article history
Received:
June 04 2021
Accepted:
September 09 2021
Citation
Kun Han, Hanyu Wang, Liang Wu, Yu Cao, Dong-Chen Qi, Changjian Li, Zhen Huang, Xiao Li, X. Renshaw Wang; Reversible modulation of metal–insulator transition in VO2 via chemically induced oxygen migration. Appl. Phys. Lett. 27 September 2021; 119 (13): 133102. https://doi.org/10.1063/5.0058989
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