Here, we study the temperature-dependent transport properties of OFETs with the prototypical OSC 6,13-bis(triisopropylsilylethynyl)pentacene (TIPS-pentacene) co-processed with polystyrene (PS) as the active layer. The active layer is deposited directly on SiO2 using the bar-assisted meniscus shearing (BAMS) method. The co-processing with PS favors a consequential decrease in interfacial trap densities as previously reported. Furthermore, we demonstrate how this processing method leads to devices exhibiting activation energies well below the current state of the art for TIPS-pentacene on SiO2 or other dielectrics. Altogether, our study reports on TIPS-pentacene thin films exhibiting an activation energy (Ea) as low as 15 meV when the active material is blended with PS and processed via BAMS. Such an unprecedentedly low value originates not only from a decrease in the interfacial trap densities but also from trapping energies much shallower than previously reported elsewhere for the same material. This allows us to clarify the previously reported notion that significant passivation of interfacial traps occurs following the separation of PS from TIPS-pentacene into an individual layer at the interface with the insulator and to confirm that the enhanced transport originates from a synergistic effect wherein both trapping density and depth are reduced.
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6 September 2021
Research Article|
September 08 2021
Low activation energy field-effect transistors fabricated by bar-assisted meniscus shearing
Melissa Berteau-Rainville;
Melissa Berteau-Rainville
1
Institut National de la Recherche Scientifique (INRS), Centre Énergie Matériaux Télécommunications
, Varennes, Quebec G1K 9A9, Canada
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Adrián Tamayo;
Adrián Tamayo
2
Institute of Materials Science of Barcelona (ICMAB-CSIC)
, Campus UAB, 08193 Bellaterra, Spain
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Tim Leydecker;
Tim Leydecker
1
Institut National de la Recherche Scientifique (INRS), Centre Énergie Matériaux Télécommunications
, Varennes, Quebec G1K 9A9, Canada
3
Institute of Fundamental and Frontier Sciences, University of Electronic Science and Technology of China
, Chengdu 610054, China
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Atiye Pezeshki;
Atiye Pezeshki
1
Institut National de la Recherche Scientifique (INRS), Centre Énergie Matériaux Télécommunications
, Varennes, Quebec G1K 9A9, Canada
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Ingo Salzmann
;
Ingo Salzmann
4
Department of Physics, Department of Chemistry and Biochemistry, Centre for Research in Molecular Modeling (CERMM), Centre for NanoScience Research (CeNSR), Concordia University
, Montreal, Quebec H4B 1R6, Canada
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Marta Mas-Torrent;
Marta Mas-Torrent
a)
2
Institute of Materials Science of Barcelona (ICMAB-CSIC)
, Campus UAB, 08193 Bellaterra, Spain
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Emanuele Orgiu
Emanuele Orgiu
a)
1
Institut National de la Recherche Scientifique (INRS), Centre Énergie Matériaux Télécommunications
, Varennes, Quebec G1K 9A9, Canada
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Appl. Phys. Lett. 119, 103301 (2021)
Article history
Received:
June 11 2021
Accepted:
August 19 2021
Citation
Melissa Berteau-Rainville, Adrián Tamayo, Tim Leydecker, Atiye Pezeshki, Ingo Salzmann, Marta Mas-Torrent, Emanuele Orgiu; Low activation energy field-effect transistors fabricated by bar-assisted meniscus shearing. Appl. Phys. Lett. 6 September 2021; 119 (10): 103301. https://doi.org/10.1063/5.0059735
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