Neuromorphic computing that mimics the biological brain has been demonstrated as a next-generation computing method due to its low power consumption and parallel data processing characteristics. To realize neuromorphic computing, diverse neural networks such as deep neural networks (DNNs) and spiking neural networks (SNNs) have been introduced. DNNs require artificial synapses that have analog conductance modulation characteristics, whereas SNNs require artificial synapses that have conductance modulation characteristics controlled by temporal relationships between signals, so the development of a multifunctional artificial synapse is required. In this work, we report a ferroelectric thin-film transistor (FeTFT) that uses zirconium-doped hafnia (HfZrOx) and indium zinc tin oxide (IZTO) for neuromorphic applications. With reliable conductance modulation characteristics, we suggest that the FeTFT with HfZrOx and IZTO can be used as an artificial synapse for both DNNs and SNNs. The linear and symmetric conductance modulation characteristics in FeTFTs result in high recognition accuracy (93.1%) of hand-written images, which is close to the accuracy (94.1%) of an ideal neural network. Also, we show that the FeTFTs can emulate diverse forms of spike-time-dependent plasticity, which is an important learning rule for SNNs. These results suggest that FeTFT is a promising candidate to realize neuromorphic computing hardware.
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18 January 2021
Research Article|
January 19 2021
Oxide semiconductor-based ferroelectric thin-film transistors for advanced neuromorphic computing
Special Collection:
Ferroelectricity in Hafnium Oxide: Materials and Devices
Min-Kyu Kim;
Min-Kyu Kim
Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH)
, Pohang 37673, Korea
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Ik-Jyae Kim;
Ik-Jyae Kim
Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH)
, Pohang 37673, Korea
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Jang-Sik Lee
Jang-Sik Lee
a)
Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH)
, Pohang 37673, Korea
a)Author to whom correspondence should be addressed: jangsik@postech.ac.kr
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a)Author to whom correspondence should be addressed: jangsik@postech.ac.kr
Note: This paper is part of the Special Topic on Materials and Devices Utilizing Ferroelectricity in Hafnium Oxide.
Appl. Phys. Lett. 118, 032902 (2021)
Article history
Received:
November 01 2020
Accepted:
December 24 2020
Citation
Min-Kyu Kim, Ik-Jyae Kim, Jang-Sik Lee; Oxide semiconductor-based ferroelectric thin-film transistors for advanced neuromorphic computing. Appl. Phys. Lett. 18 January 2021; 118 (3): 032902. https://doi.org/10.1063/5.0035741
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