In this paper, we report a non-contact and quantitative method to evaluate the permittivity of semiconductor nanomaterials. A microwave atomic force microscopy (M-AFM) was used to obtain the topography and microwave images of nanomaterials in one scanning process. Morphology and microwave images of ZnO and CuO nanowires, and SnO2 nanobelts with high spatial resolution were obtained in the non-contact mode of M-AFM. The local relative permittivity of these one-dimensional metal oxide nanomaterials was quantitatively evaluated.
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