With exceptional electrical and mechanical properties and at the same time air-stability, layered MoSi2N4 has recently drawn great attention. However, band structure engineering via strain and electric field, which is vital for practical applications, has not yet been explored. In this work, we show that the biaxial strain and external electric field are effective ways for the bandgap engineering of bilayer MoSi2N4 and WSi2N4. It is found that strain can lead to indirect bandgap to direct bandgap transition. On the other hand, electric field can result in semiconductor to metal transition. Our study provides insights into the band structure engineering of bilayer MoSi2N4 and WSi2N4 and would pave the way for its future nanoelectronics and optoelectronics applications.
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15 March 2021
Research Article|
March 16 2021
Semiconductor-to-metal transition in bilayer MoSi2N4 and WSi2N4 with strain and electric field
Qingyun Wu
;
Qingyun Wu
a)
1
Science, Mathematics, and Technology, Singapore University of Technology and Design (SUTD)
, 8 Somapah Road, Singapore 487372, Singapore
a)Authors to whom correspondence should be addressed: qingyun_wu@sutd.edu.sg and ricky_ang@sutd.edu.sg
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Liemao Cao
;
Liemao Cao
2
College of Physics and Electronic Engineering, Hengyang Normal University
, Hengyang 421002, China
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Yee Sin Ang
;
Yee Sin Ang
1
Science, Mathematics, and Technology, Singapore University of Technology and Design (SUTD)
, 8 Somapah Road, Singapore 487372, Singapore
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Lay Kee Ang
Lay Kee Ang
a)
1
Science, Mathematics, and Technology, Singapore University of Technology and Design (SUTD)
, 8 Somapah Road, Singapore 487372, Singapore
a)Authors to whom correspondence should be addressed: qingyun_wu@sutd.edu.sg and ricky_ang@sutd.edu.sg
Search for other works by this author on:
a)Authors to whom correspondence should be addressed: qingyun_wu@sutd.edu.sg and ricky_ang@sutd.edu.sg
Appl. Phys. Lett. 118, 113102 (2021)
Article history
Received:
January 16 2021
Accepted:
February 06 2021
Connected Content
A companion article has been published:
The effects of strain and electric field in MoSi2N4 and WSi2N4 bilayers
Citation
Qingyun Wu, Liemao Cao, Yee Sin Ang, Lay Kee Ang; Semiconductor-to-metal transition in bilayer MoSi2N4 and WSi2N4 with strain and electric field. Appl. Phys. Lett. 15 March 2021; 118 (11): 113102. https://doi.org/10.1063/5.0044431
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