We grew thin films of a heavy fermion chiral magnet YbNi3Al9 by using molecular beam epitaxy. They were grown on c-plane sapphire substrates under ultra-high vacuum while maintaining a deposition rate at a stoichiometric ratio among Yb, Ni, and Al. The resulting thin films contain epitaxial grains with the c axis parallel to the substrate surface: The YbNi3Al9 c axis is parallel to the sapphire b or a axis. The temperature dependence of the resistivity exhibits a typical feature of a dense Kondo system with a broad shoulder structure at ∼40 K, as well as a kink as a signature of the chiral helimagnetic ordering at 3.6 K. These features are consistent with those previously observed in bulk samples. The shift in the kink associated with the field-induced phase transition is found in the magnetoresistance curves under a magnetic field applied in the direction perpendicular to the c-axis. The magnetic phase diagram well reproduces that for the bulk crystals, implying that the chiral soliton lattice phase arises under magnetic fields, even in thin films.
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8 March 2021
Research Article|
March 08 2021
Thin film growth of heavy fermion chiral magnet YbNi3Al9
Hiroaki Shishido
;
Hiroaki Shishido
a)
1
Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University
, Sakai, Osaka 599-8531, Japan
2
NanoSquare Research Institute, Osaka Prefecture University
, Sakai, Osaka 599-8531, Japan
a)Author to whom correspondence should be addressed: shishido@pe.osakafu-u.ac.jp
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Akira Okumura;
Akira Okumura
1
Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University
, Sakai, Osaka 599-8531, Japan
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Tatsuya Saimyoji;
Tatsuya Saimyoji
1
Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University
, Sakai, Osaka 599-8531, Japan
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Shota Nakamura;
Shota Nakamura
3
Department of Physical Science and Engineering, Graduate School of Engineering, Nagoya Institute of Technology
, Nagoya 466-8555, Japan
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Shigeo Ohara;
Shigeo Ohara
3
Department of Physical Science and Engineering, Graduate School of Engineering, Nagoya Institute of Technology
, Nagoya 466-8555, Japan
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Yoshihiko Togawa
Yoshihiko Togawa
1
Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University
, Sakai, Osaka 599-8531, Japan
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a)Author to whom correspondence should be addressed: shishido@pe.osakafu-u.ac.jp
Appl. Phys. Lett. 118, 102402 (2021)
Article history
Received:
October 28 2020
Accepted:
February 10 2021
Citation
Hiroaki Shishido, Akira Okumura, Tatsuya Saimyoji, Shota Nakamura, Shigeo Ohara, Yoshihiko Togawa; Thin film growth of heavy fermion chiral magnet YbNi3Al9. Appl. Phys. Lett. 8 March 2021; 118 (10): 102402. https://doi.org/10.1063/5.0035385
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