Transition metal dichalcogenides (TMDCs) are promising for future electronic and optoelectronic applications, such as field effect transistors (FETs), for their high carrier mobility with a thin layer, wide bandgap, and organic-like flexibility. However, background doping and unipolar electrical characteristics are commonly observed in TMDCs and their based FETs due to the naturally inevitable vacancy defects, which limit their application in electronics and optoelectronics systems. Here, taking MoS2 as an example, in a TMDC FET, ambipolar properties were achieved at room temperature by introducing an amorphous solid ionic conductor lithium tantalate (LiTaO3) as the gate dielectric, which could guarantee the modulation of the Fermi level in the MoS2 channel by the gate electric field. Based on the modulation mechanisms by the solid ionic conductor-gated electric field for the transformation of conduction mode, the three-terminal device exhibits a gate-controlled rectifying, that is, thyristor performance with a high rectification ratio over 300 obtained at a low gate voltage of 2 V. The present results show the great potential of TMDCs in future logic and other electronic device applications.
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3 August 2020
Research Article|
August 07 2020
Transition metal dichalcogenides thyristor realized by solid ionic conductor gate induced doping
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Guangyao Wang;
Guangyao Wang
1
College of Materials Science and Engineering, Beijing University of Technology
, Beijing 100124, People's Republic of China
2
The Key Laboratory of Advanced Functional Materials, Ministry of Education of China
, Beijing 100124, People's Republic of China
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Wenjie Deng;
Wenjie Deng
1
College of Materials Science and Engineering, Beijing University of Technology
, Beijing 100124, People's Republic of China
2
The Key Laboratory of Advanced Functional Materials, Ministry of Education of China
, Beijing 100124, People's Republic of China
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Xiaoqing Chen;
Xiaoqing Chen
1
College of Materials Science and Engineering, Beijing University of Technology
, Beijing 100124, People's Republic of China
2
The Key Laboratory of Advanced Functional Materials, Ministry of Education of China
, Beijing 100124, People's Republic of China
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Peng Wang;
Peng Wang
1
College of Materials Science and Engineering, Beijing University of Technology
, Beijing 100124, People's Republic of China
2
The Key Laboratory of Advanced Functional Materials, Ministry of Education of China
, Beijing 100124, People's Republic of China
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Yu Xiao;
Yu Xiao
3
Key Laboratory of Micro-Nano Measurement-Manipulation and Physics (Ministry of Education), Department of Physics, Beihang University
, Beijing 100191, People's Republic of China
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Jingfeng Li;
Jingfeng Li
1
College of Materials Science and Engineering, Beijing University of Technology
, Beijing 100124, People's Republic of China
2
The Key Laboratory of Advanced Functional Materials, Ministry of Education of China
, Beijing 100124, People's Republic of China
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Feihong Chu;
Feihong Chu
1
College of Materials Science and Engineering, Beijing University of Technology
, Beijing 100124, People's Republic of China
2
The Key Laboratory of Advanced Functional Materials, Ministry of Education of China
, Beijing 100124, People's Republic of China
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Beiyun Liu;
Beiyun Liu
1
College of Materials Science and Engineering, Beijing University of Technology
, Beijing 100124, People's Republic of China
2
The Key Laboratory of Advanced Functional Materials, Ministry of Education of China
, Beijing 100124, People's Republic of China
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Yongfeng Chen;
Yongfeng Chen
1
College of Materials Science and Engineering, Beijing University of Technology
, Beijing 100124, People's Republic of China
2
The Key Laboratory of Advanced Functional Materials, Ministry of Education of China
, Beijing 100124, People's Republic of China
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Yue Lu;
Yue Lu
1
College of Materials Science and Engineering, Beijing University of Technology
, Beijing 100124, People's Republic of China
4
Institute of Microstructure and Property of Advanced Materials, Beijing University of Technology
. No.100, Pingleyuan, Chaoyang District, Beijing 100124, People's Republic of China
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Manling Sui
;
Manling Sui
1
College of Materials Science and Engineering, Beijing University of Technology
, Beijing 100124, People's Republic of China
4
Institute of Microstructure and Property of Advanced Materials, Beijing University of Technology
. No.100, Pingleyuan, Chaoyang District, Beijing 100124, People's Republic of China
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Zhihong Liu;
Zhihong Liu
5
School of Microelectronics, Xidian University
, Xi'an 710071, People's Republic of China
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Xungang Diao;
Xungang Diao
3
Key Laboratory of Micro-Nano Measurement-Manipulation and Physics (Ministry of Education), Department of Physics, Beihang University
, Beijing 100191, People's Republic of China
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Hui Yan;
Hui Yan
1
College of Materials Science and Engineering, Beijing University of Technology
, Beijing 100124, People's Republic of China
2
The Key Laboratory of Advanced Functional Materials, Ministry of Education of China
, Beijing 100124, People's Republic of China
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Yongzhe Zhang
Yongzhe Zhang
a)
1
College of Materials Science and Engineering, Beijing University of Technology
, Beijing 100124, People's Republic of China
2
The Key Laboratory of Advanced Functional Materials, Ministry of Education of China
, Beijing 100124, People's Republic of China
a)Author to whom correspondence should be addressed: [email protected]
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a)Author to whom correspondence should be addressed: [email protected]
Appl. Phys. Lett. 117, 053102 (2020)
Article history
Received:
June 08 2020
Accepted:
July 20 2020
Citation
Guangyao Wang, Wenjie Deng, Xiaoqing Chen, Peng Wang, Yu Xiao, Jingfeng Li, Feihong Chu, Beiyun Liu, Yongfeng Chen, Yue Lu, Manling Sui, Zhihong Liu, Xungang Diao, Hui Yan, Yongzhe Zhang; Transition metal dichalcogenides thyristor realized by solid ionic conductor gate induced doping. Appl. Phys. Lett. 3 August 2020; 117 (5): 053102. https://doi.org/10.1063/5.0017432
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