Tellurene—the 2D form of elemental tellurium—provides an attractive alternative to conventional 2D semiconductors due to its high bipolar mobilities, facile solution processing, and the possibility of dopant intercalation into its 1D van der Waals lattice. Here, we study the microscopic origin of transport anisotropy in lithographically defined four-terminal tellurene devices using spatially resolved near-field scanning microwave microscopy (SMM). Our conductivity- and carrier type-sensitive SMM imaging reveals that the overall p-type transport measured between adjacent and opposite terminals originates from strong p-type character at the device edges. Despite using an atomic layer deposition-grown conformal overcoat that n-dopes the device interior, we observe only weak n-type transport along the main device channel at positive backgate voltages. This weak n-type transport along the device channel is shown to arise from local p-doping within a few micrometers of the electrodes, which produces a transport barrier from the n-type interior to the electrodes. These results reveal how the backgate-dependent conduction anisotropy could be leveraged to weigh different inputs for non-von Neumann architectures.
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21 December 2020
Research Article|
December 22 2020
Microscopic origin of inhomogeneous transport in four-terminal tellurene devices
Special Collection:
2D Transistors
Benjamin M. Kupp
;
Benjamin M. Kupp
1
Applied Physics Division, National Institute of Standards and Technology
, Boulder, Colorado 80305, USA
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Gang Qiu
;
Gang Qiu
2
School of Electrical and Computer Engineering, and Birck Nanotechnology Center, Purdue University
, West Lafayette, Indiana 47907, USA
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Yixiu Wang;
Yixiu Wang
3
School of Industrial Engineering, and Birck Nanotechnology Center, Purdue University
, West Lafayette, Indiana 47907, USA
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Clayton B. Casper
;
Clayton B. Casper
4
Department of Chemistry, University of North Carolina at Chapel Hill
, Chapel Hill, North Carolina 27599, USA
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Thomas M. Wallis;
Thomas M. Wallis
1
Applied Physics Division, National Institute of Standards and Technology
, Boulder, Colorado 80305, USA
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Joanna M. Atkin
;
Joanna M. Atkin
4
Department of Chemistry, University of North Carolina at Chapel Hill
, Chapel Hill, North Carolina 27599, USA
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Wenzhuo Wu;
Wenzhuo Wu
3
School of Industrial Engineering, and Birck Nanotechnology Center, Purdue University
, West Lafayette, Indiana 47907, USA
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Peide D. Ye
;
Peide D. Ye
2
School of Electrical and Computer Engineering, and Birck Nanotechnology Center, Purdue University
, West Lafayette, Indiana 47907, USA
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Pavel Kabos;
Pavel Kabos
1
Applied Physics Division, National Institute of Standards and Technology
, Boulder, Colorado 80305, USA
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Samuel Berweger
Samuel Berweger
a)
1
Applied Physics Division, National Institute of Standards and Technology
, Boulder, Colorado 80305, USA
a)Author to whom correspondence should be addressed: samuel.berweger@nist.gov
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a)Author to whom correspondence should be addressed: samuel.berweger@nist.gov
Appl. Phys. Lett. 117, 253102 (2020)
Article history
Received:
August 19 2020
Accepted:
December 06 2020
Citation
Benjamin M. Kupp, Gang Qiu, Yixiu Wang, Clayton B. Casper, Thomas M. Wallis, Joanna M. Atkin, Wenzhuo Wu, Peide D. Ye, Pavel Kabos, Samuel Berweger; Microscopic origin of inhomogeneous transport in four-terminal tellurene devices. Appl. Phys. Lett. 21 December 2020; 117 (25): 253102. https://doi.org/10.1063/5.0025955
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